Methods and apparatus for providing a multi-stop micromirror

• US 6,614,581 B2
• Filed: 07/03/2001
• Issued: 09/02/2003
• Est. Priority Date: 07/03/2001
• Status: Active Grant

• Current Assignee: Altera Corporation (Intel Corporation)
• Original Assignee: Network Photonics, Inc.
• Inventors: Anderson, David P.
• Primary Examiner(s): Ben, Loha
• Application Number:
  US09/899,014
• Publication Number:
  US 20030007237A1
• Time in Patent Office: 791 Days
• Field of Search: 359/290, 359/291, 359/292, 359/295, 359/298, 359/293, 359/223, 359/224, 359/230, 359/225, 427/162, 427/534, 248/487, 248/484, 248/485, 385/18
• US Class Current: 359/295
• CPC Class Codes: B81B 3/0062 Devices moving in two or more dimensions, i.e. having special features which allow movement in more than one dimension
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means

Abstract

A microstructure is provided which facilitates alignment by allowing movement of the microstructure between one of a plurality of positions. The microstructure is included in an electromechanical machine which comprises a base layer, an actuator and two or more structural plates. One of the structural plates can be deflected to select a movement limit for the other structural plate. Methods for configuring the structural plates relative to each other to facilitate alignment are also provided.

Claims

1. An electromechanical machine, the machine comprising:

a base layer;

an actuator disposed on the base layer;

a first structural plate supported by a first pivot and disposed above the base layer;

a second structural plate supported by a second pivot and disposed above the base layer, wherein a first side of the second structural plate is closer to the first structural plate than a second side of the second structural plate; and

wherein activation of the actuator causes a side of the first structural plate to deflect toward the base layer, and wherein the first side of the second structural plate is deflected toward the base layer.

2. The machine of claim 1, wherein the actuator is a first actuator, the machine further comprising:

a second actuator disposed on the base layer; and

wherein activation of the second actuator causes the second side of the second structural plate to be closer to the base layer than the first side of the second structural plate, and wherein activation of the first actuator causes the first structural plate to contact the first side of the second structural plate.

3. The machine of claim 2, wherein activation of the second actuator causes the second side of the second structural plate to contact a structure disposed on the base layer.

4. The machine of claim 1, wherein an edge of the first structural plate is disposed above a portion of the first side of the second structural plate.

5. The machine of claim 1, wherein the first structural plate comprises a mirror.

6. The machine of claim 1, wherein the base layer comprises a silicon substrate.

7. The machine of claim 1, wherein the second structural plate is a cantilever beam with an edge of the second side disposed closer to the pivot than an edge of the first side.

8. The machine of claim 1, wherein the first structural plate is a cantilever beam.

9. The machine of claim 1, wherein the first pivot is a post.

10. The machine of claim 1, wherein the first pivot is a bar extending a substantial portion of a length of the first structural plate.

11. The machine of claim 1, wherein the first structural plate is disposed approximately 10 microns from the base layer and the second structural plate is disposed approximately 5 microns from the base layer.

12. A method for moving plates in an electromechanical device between a plurality of stop positions, the method comprising:

providing a first plate supported by a first pivot and disposed above a base layer;

providing a second plate supported by a second pivot and disposed above the base layer;

moving the second plate to select a stop position for the first plate, the stop position being one of a plurality of possible stop positions; and

moving the first plate to the selected stop position.

13. The method of claim 12, wherein moving the second plate to select a stop position comprises pivoting the second plate until an edge of the second plate contacts the base layer or a structure disposed thereon.

14. The method of claim 13, wherein the selected stop position is a point where the first plate contacts the base layer or a structure thereon.

15. The method of claim 13, wherein moving the first plate to the selected stop position comprises moving the first plate until an edge of the first plate contacts the base layer or a structure thereon.

16. The method of claim 13, wherein the selected stop position is a point where the first plate is stopped by an electric field.

17. The method of claim 12, wherein the selected stop position is a point where the first plate and the second plate contact.

18. The method of claim 12, wherein moving the first plate to the selected stop position comprises moving the first plate until an edge of the first plate contacts the second plate.

19. The method of claim 12, wherein moving the second plate to select a stop position comprises pivoting the second plate until an edge of the second plate contacts a structure disposed over the base layer.

20. The method of claim 12, further comprising:

providing a first actuator, a second actuator, and a third actuator;

wherein moving the first plate comprises energizing the first actuator; and

wherein moving the second plate comprises energizing at least one actuator selected from the group consisting of;

the first actuator, the second actuator and the third actuator.

21. The method of claim 20, wherein the first plate and the second plate are approximately parallel to the base layer when the first actuator, the second actuator and the third actuator are de-energized.

22. The method of claim 21, wherein the first plate comprises a mirror.

23. A method for configuring plates in an electromechanical device between a plurality of stop positions to provide alignment of the electromechanical device, the method comprising:

providing a base layer;

providing a plate supported by a first pivot and disposed above the base layer;

selecting a stop position from at least four possible stop positions, wherein one of the at least four stop positions is a static position; and

moving the plate to the selected stop position.

24. The method of claim 23, wherein the plate is a first plate, the method further comprising:

providing a second plate supported by a second pivot and disposed above the base layer; and

wherein selecting the stop position comprises moving the second plate until it contacts the base layer or a structure thereon.

25. The method of claim 24, wherein the stop position is a first stop position comprising a first point where the first plate contacts the base layer or a first structure disposed thereon, the method further comprising:

a second stop position comprising a second point where the first plate contacts the second plate, and wherein the second plate contacts the base layer or a second structure disposed thereon.

26. A wavelength router for receiving light having a plurality of spectral bands at an input port and directing a subset of the spectral bands to one of a plurality of output ports, the wavelength router comprising:

a free-space optical train disposed between the input port and the output ports, wherein the optical train provides at least one path for routing the subset of the spectral bands, the optical train including a dispersive element disposed to intercept light traveling from the input port; and

a routing mechanism having at least one dynamically configurable routing element to direct a given spectral band to different output ports depending on a state of the dynamically configurable routing element, wherein the dynamically configurable routing element comprises;

a micromirror assembly disposed over a base layer; and

a control member disposed adjacent the micromirror assembly, wherein deflection of the control member selects a movement limit for the micromirror assembly.

27. The wavelength router recited in claim 26 wherein the dynamically configurable routing element further comprises:

a first actuator disposed on the base layer and under a side of the micromirror assembly; and

a second actuator disposed on the base layer and under a side of the control member, wherein activation of the first and the second actuators cause the control member to deflect to a hard stop and the micromirror assembly to deflect to contact the control member.

28. Computer readable code for execution by a microprocessor, wherein the computer readable code causes the microprocessor to configure plates in a micromirror device, and wherein configuring the plates comprises:

moving a first plate to select a stop position for a second plate, the stop position selected from a plurality of stop positions; and

moving the second plate to the selected stop position.