Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes

• US 6,616,766 B2
• Filed: 12/30/2002
• Issued: 09/09/2003
• Est. Priority Date: 07/08/1999
• Status: Expired due to Fees

• Current Assignee: Aixtron Inc. (Aixtron AG)
• Original Assignee: Genus PLC
• Inventors: Dunham, Scott William
• Primary Examiner(s): GHYKA, ALEXANDER G
• Application Number:
  US10/335,404
• Publication Number:
  US 20030101934A1
• Time in Patent Office: 253 Days
• Field of Search: 118/715, 239/132.3, 239/132, 239/424, 438/758, 438/795, 427/585
• US Class Current: 118/715
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45572 Cooled nozzles
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: H01J 37/3244 Gas supply means

Abstract

A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber. In preferred embodiments the supply ports, transition passages, and diffusion passages into the chamber do not align, and there is a special plasma-quenching ring in each of the second channels preventing plasma ignition within the channels in the showerhead methods and systems using the showerhead are also taught.

Claims

1. A showerhead diffuser apparatus for a CVD process, comprising:

a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels;

a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus;

a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region; and

a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.

2. The showerhead apparatus of claim 1 wherein the second side comprises a flat surface such that the diffusion passages from the second channels open into the reactor chamber on a plane.

3. The showerhead apparatus of claim 1 wherein the vacuum seal interface comprises a flange having bolt holes and an o-ring for mounting to and sealing to a wall of the reactor chamber.

4. The showerhead apparatus of claim 1 wherein the supply ports into the first channels and the transition passages from the first channels into second channels are offset in position such that no supply port is aligned with a transition passage.

5. The showerhead apparatus of claim 1 wherein the transition passages into the second channels are offset from the diffusion passages into the reactor chamber such that no transition passage is aligned with a diffusion passage.

6. The showerhead apparatus of claim 1 further comprising coolant channels in walls separating second channels in the second channel region, the coolant channels interconnected such that a single inlet port and a single outlet port provides coolant through al of the coolant channels.

7. The showerhead apparatus of claim 6 comprising an inlet and an outlet supply tube extending from the first side connecting to the inlet ad the outlet ports.

8. A CVD reactor system, comprising:

a reactor chamber having an opening for a showerhead apparatus;

a support in the chamber adjacent the opening, the support for a substrate to be processed; and

a showerhead diffuser apparatus for a CVD process, the showerhead having a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region, and a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.

9. The CVD reactor system of claim 8 wherein the second side comprises a flat surface such that the diffusion passages from the second channels open into the reactor chamber on a plane.

10. The CVD reactor system of claim 8 wherein the vacuum seal interface comprises a flange having bolt holes and an o-ring for mounting to and sealing to a wall of the reactor chamber.

11. The CVD reactor system of claim 8 wherein the supply ports into the first channels and the transition passages from the first channels into second channels are offset in position such that no supply port is aligned with a transition passage.

12. The CVD reactor system of claim 8 wherein the transition passages into the second channels are offset from the diffusion passages into the reactor chamber such that no transition passage is aligned with a diffusion passage.

13. The CVD reactor system of claim 8 further comprising coolant channels in walls separating second channels in the second channel region, the coolant channels interconnected such that a single inlet port and a single outlet port provides coolant through al of the coolant channels.

14. CVD reactor system of claim 13 comprising an inlet and an outlet supply tube extending from the first side connecting to the inlet ad the outlet ports.

15. A gas diffuser apparatus for a CVD-related coating process, comprising:

a plurality of independent radially-concentric channels having individual gas supply ports for supplying gases or vapors from a first side of the apparatus to individual ones of the first channels;

a pattern of diffusion passages leading from individual ones of the independent channels to a pattern of openings in a second side for supplying the gases or vapors to a process chamber; and

a mechanism for providing the gases or vapors alternately.

16. The showerhead apparatus of claim 15 wherein the second side comprises a substantially flat surface such that the openings for supplying the gases or vapors to a process chamber are arranged open into the chamber on a plane.

17. The showerhead apparatus of claim 15 wherein the supply ports into the first channels and the openings for supplying the gases or vapors to a process chamber are offset in position such that no supply port is aligned with a transition passage.

18. The showerhead apparatus of claim 15 further comprising a second set of channels connected to the first set by transition passages with the openings for supplying gases or vapors to a process chamber proceeding from the second set of channels, wherein the openings and the transition passages are offset.

19. The showerhead apparatus of claim 15 further comprising coolant passages in walls separating channels, the coolant passages interconnected such that a single inlet port and a single outlet port provides coolant through all of the coolant passages.

20. A reactor system, comprising:

a process chamber having a mounting position for a gas diffuser apparatus;

a support in the chamber substantially adjacent the mounting position, the support for supporting a substrate to be processed; and

a gas diffuser apparatus at the mounting position, the showerhead diffuser apparatus comprising a plurality of independent radially-concentric channels having individual gas supply ports for supplying gases or vapors from a first side of the apparatus to individual ones of the first channels, a pattern of diffusion passages leading from individual ones of the independent channels to a pattern of openings in a second side for supplying the gases or vapors to the process chamber, and a mechanism for providing the gases or vapors alternately.

21. The reactor system of claim 20 wherein the second side comprises a substantially flat surface such that the openings for supplying the gases or vapors to a process chamber are arranged open into the chamber on a plane.

22. The reactor system of claim 20 wherein the mounting position comprises a vacuum seal interface for mounting the gas diffuser apparatus from outside the process chamber.

23. The reactor system of claim 20 further comprising a second set of channels connected to the first set by transition passages, the openings for supplying gases or vapors to the process chamber proceeding from the second set of channels, wherein the transition passages and the gas supply ports are offset.

24. The CVD reactor system of claim 20 further comprising coolant passages in walls separating channels, the coolant passages interconnected such that a single inlet port and a single outlet port provides coolant through all of the coolant channels.

25. A method for distributing gases or vapors to a substrate in a coating process, comprising steps of:

(a) introducing the gases or vapors alternately via individual supply ports into individual ones of a plurality of independent radially-concentric channels from a first side of the apparatus to individual ones of the first channels;

(b) flowing the gases or vapors from the first channels via a pattern of diffusion passages leading from individual ones of the independent channels to a pattern of openings in a second side for supplying the gases or vapors to a process chamber.

26. The method of claim 25 wherein the supply ports, the transition passages and the openings for supplying the gases or vapors to the process chamber are arranged to be non-linear.