Method and apparatus for microlithography

• US 6,624,880 B2
• Filed: 01/18/2001
• Issued: 09/23/2003
• Est. Priority Date: 01/18/2001
• Status: Expired due to Term

• Current Assignee: Fraunhofer Gesellschaft Zur Foerderung Der Angewandten Forsching E.V., Micronic Laser Systems AB (Mycronic AB)
• Original Assignee: Fraunhofer Gesellschaft Zur Foerderung Der Angewandten Forsching E.V., Micronic Laser Systems AB (Mycronic AB)
• Inventors: Sandström, Torbjörn, Dürr, Peter, Lakner, Hubert Karl
• Primary Examiner(s): Adams, Russell
• Assistant Examiner(s): Kim, Peter B
• Application Number:
  US09/765,084
• Publication Number:
  US 20020105629A1
• Time in Patent Office: 978 Days
• Field of Search: 355/71, 355/53, 355/67, 355/40, 355/43, 347/135, 347/255, 347/258, 250/492.1, 359/231, 359/291
• US Class Current: 355/71
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

The present invention relates to an apparatus and method for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation. Said apparatus comprising a source for emitting electromagnetic radiation directed onto a selected object plane, a computer-controlled reticle comprising a plurality of object pixels, adapted to receive said electromagnetic radiation at said selected object plane and being capable of relaying said electromagnetic radiation toward said work piece arranged at said image plane, an optical projection system comprising a Fourier filter adapted to filter said relayed radiation in a Fourier space and a first lens arrangement adapted to create essentially parallel central axis of cones of radiation onto said image plane, where every cone of radiation in a specific image pixel in said image plane corresponds to a specific object pixel in said computer-controlled reticle. The invention also relates to a method for patterning a work piece sensitive to electromagnetic radiation.

Claims

1. An apparatus (100) for patterning a work piece (60) arranged at an image plane and sensitive to electromagnetic radiation, comprising:

a source (10) emitting electromagnetic radiation onto an object plane;

a computer-control led reticle (30) comprising a plurality of object pixels, adapted to receive said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said work piece (60); and

an optical projection system comprising a Fourier filter adapted to filter said relayed electromagnetic radiation in a Fourier space and a first lens arrangement (50) adapted to project essentially parallel central axes of cones of radiation onto said image plane.

2. The apparatus of claim 1, wherein the cones of radiation in a specific pixel in said computer-controlled reticle (30) are projected on a corresponding specific pixel in said image plane.

3. The apparatus according to claim 1, further comprising a beam conditioner unit (20) having an exit pupil focused at infinity.

4. The apparatus according to claim 3, wherein said Fourier filter comprises a third lens arrangement (40) and a spatial filter (70) adapted to block out essentially all first and higher order diffractions of the relayed electromagnetic radiation.

5. The apparatus according to claim 4, wherein the spatial filter is adapted by its size and position.

6. The apparatus according to claim 4, wherein said spatial filter (70) is an aperture in a plate.

7. The apparatus according to claim 1, wherein said Fourier filter comprises a third lens arrangement (40) and a spatial filter (70) adapted to block out essentially all first and higher order diffractions of the relayed electromagnetic radiation.

8. The apparatus according to claim 7, wherein the spatial filter is adapted by its size and position.

9. The apparatus according to claim 7, wherein said spatial filter (70) is an aperture in a plate.

10. The apparatus according to claim 9, further comprising a ¼

-wave plate arranged in the radiation path between said computer-controlled reticle and said beam splitter.

11. The apparatus according to claim 9, wherein said beam splitter (25) having a first surface and a second surface that are not parallel.

12. The apparatus according to claim 9, wherein said beam splitter (25) having a first surface and a second surface that are parallel.

13. The apparatus according to claim 1, further comprising a beam splitter (25) arranged anywhere in a radiation path between said computer-controlled reticle (30) and said first lens arrangement (50).

14. The apparatus according to claim 13, wherein said electromagnetic radiation is transmitted through said beam splitter (25) before it is relayed by said computer-controlled reticle (30) or reflected by said beam splitter (25).

15. The apparatus according to claim 13, wherein said electromagnetic radiation is reflected by said beam splitter (25) before it is relayed by said computer-controlled reticle (30) or transmitted through said beam splitter (25).

16. The apparatus according to claim 1, wherein said computer-controlled reticle (30) is a Spatial Light Modulator (SLM).

17. The apparatus according to claim 1, wherein said computer-controlled reticle (30) is a deflecting micro mirror device.

18. The apparatus according to claim 1, wherein said computer-controlled reticle (30) is a grating light valve.

19. The apparatus according to claim 1, wherein said computer-controlled reticle (30) is a silicon light valve.

20. The apparatus according to claim 1, wherein said computer-controlled reticle (30) is a liquid crystal modulator.

21. The apparatus according to claim 1, wherein said source for emitting electromagnetic radiation (10) is a continuous radiation source.

22. The apparatus according to claim 21, wherein said source for emitting electromagnetic radiation (10) is a laser source.

23. The apparatus according to claim 1, wherein said source for emitting electromagnetic radiation (10) is a pulsed radiation source.

24. The apparatus according to claim 23, wherein said source for emitting electromagnetic radiation (10)is a laser source.

25. The apparatus according to claim 1, further comprising:

a stage (95) upon which the work piece (60) rests for positioning said work piece (60) and said projection system relative to each other; and

a control system adapted to position said work piece (60) and projection system relative to each other, to feed a digital description of a pattern to be projected on said work piece (60) to said computer-controlled reticle (30) and to modulate the electromagnetic radiation.

26. The apparatus according to claim 1, wherein the essential parallel central axes of the cones are parallel within about 50 mRad.

27. A method for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation, comprising the actions of:

emitting electromagnetic radiation from a source onto a computer-controlled reticle at an object plane;

relaying and diffracting said electromagnetic radiation from the computer-controlled reticle towards said work piece;

filtering in a Fourier space the relayed and diffracted electromagnetic radiation;

transforming the relayed and diffracted electromagnetic radiation to have essentially parallel central axes of cones of radiation when it impinges on the work piece.

28. The method according to claim 27, further comprising the action of conditioning the electromagnetic radiation to have essentially parallel central axes of cones of radiation when it impinges on the computer-controlled reticle.

29. The method according to claim 28, further comprising the action of splitting the electromagnetic radiation with a beam splitter placed between said computer-controlled reticle and any lens.

30. The method according to any one of claim 29, further comprising the action transmitting the electromagnetic radiation through a ¼

-wave plate placed between said computer-controlled reticle and said beam splitter.

31. The method according to claim 27, further comprising the action of splitting the electromagnetic radiation with a beam splitter placed between said computer-controlled reticle and any lens.

32. The method according to claim 31, further comprising the action of transmitting said electromagnetic radiation through said beam splitter before it is relayed and diffracted by said computer-controlled reticle and reflected by said beam splitter.

33. The method according to any one of claim 32, further comprising the action transmitting the electromagnetic radiation through a ¼

-wave plate placed between said computer-controlled reticle and said beam splitter.

34. The method according to claim 31, further comprising the action of reflecting said electromagnetic radiation with said beam splitter before it is relayed and diffracted by said computer-controlled reticle and transmitted through said beam splitter.

35. The method according to any one of claim 34, further comprising the action transmitting the electromagnetic radiation through a ¼

-wave plate placed between said computer-controlled reticle and said beam splitter.

36. The method according to any one of claim 31, further comprising the action transmitting the electromagnetic radiation through a ¼

-wave plate placed between said computer-controlled reticle and said beam splitter.

37. The method according to claim 27, further comprising the actions of:

positioning a stage supporting said work piece and relative to a path of said electromagnetic radiation;

feeding a digital description of an image to be projected to the computer-controlled reticlel; and

controlling intensity of said electromagnetic radiation impinging on the work piece.

38. An apparatus (100) for patterning a work piece (60) arranged at an image plane and sensitive to electromagnetic radiation, comprising:

a source (10) for emitting electromagnetic radiation,

a beam conditioner unit that directs said electromagnetic radiation onto an object plane, oriented so that, at each point in the object plane, there is a predetermined angular spread between a central axis of the electromagnetic radiation and the object plane;

a computer-controlled reticle at the object plane adapted to modulating the radiation at each of a multitude of pixels in accordance to an input pattern description; and

a projection system for projecting the electromagnetic radiation from said computer-controlled reticle onto a work piece, said electromagnetic radiation oriented so that, at each point in the image plane, there is essentially a right angle between said central axis and the image plane.

39. The apparatus according to claim 38, where the exit pupil of the projection system is focused at infinity.

40. The apparatus of claim 39, further including a beam splitter positioned between a stop defining the exit pupil of the beam conditioner unit and the computer-controlled reticle.

41. The apparatus according to claim 38, where the radiation is spatially filtered is a Fourier space between the computer controlled reticle (30) and the work piece (60).

42. The apparatus according to claim 39, where said exit pupil is centered on an optical axis of the projection system.

43. An apparatus (100) for patterning a work piece (60) arranged at an image plane and sensitive to electromagnetic radiation, comprising:

a source (10) for emitting electromagnetic radiation;

a beam conditioner unit that expands and homogenizes said electromagnetic radiation and illuminates an object plane with essentially uniform intensity and angular spread;

a computer-controlled reticle at the object plane adapted to modulate the electromagnetic radiation at a multitude of pixels in accordance to an input pattern description; and

a projection system to project an image of said reticle onto a work piece with essentially uniform intensity across the work piece and with a path of the electromagnetic radiation that is essentially normal to a surface of the work piece.

44. The apparatus according to claim 43, where the exit pupil of the projection system is focused at infinity.

45. The apparatus according to claim 44, wherein said exit pupil is centered on an optical axis of the projection system.

46. The apparatus of claim 44, further including a beam splitter positioned between any lens and the computer-controlled reticle.

47. The apparatus according to claim 43, wherein the exit pupil of the beam conditioner unit (20) is focused at infinity.

48. The apparatus according to claim 47, wherein said exit pupil is centered on an optical axis of the projection system.

49. The apparatus according to claim 43, where the exit pupil of the beam conditioner unit is focused at a finite distance.

50. The apparatus according to claim 43, wherein the computer-controlled reticle is positioned to form an oblique angle between its surface and an optical axis of electromagnetic radiation impinging on the surface.

51. The apparatus according to claim 43, wherein the computer-controlled reticle is essentially perpendicular to an optical axis of the projection system and said apparatus further comprises a beam splitter transmissive to the electromagnetic radiation emitted onto the computer-controlled reticle and reflective to the electromagnetic radiation relayed by the computer-controlled reticle.

52. The apparatus according to claim 43, where the exit pupil of the beam conditioner unit is focused at infinity.

53. The apparatus according to claim 43, further including a spatial filter operating in a Fourier space positioned between the computer controlled reticle (30) and the work piece (60).

54. The apparatus according to claim 53, wherein the exit pupil of the beam conditioner unit (20) is focused at infinity.

55. The apparatus according to claim 53, where the exit pupil of the projection system is focused at infinity.

56. The apparatus of claim 55, further including a beam splitter positioned between any lens and the computer-controlled reticle.

57. The apparatus according to claim 53, wherein the computer-controlled reticle is essentially perpendicular to an optical axis of the projection system and said apparatus further comprises a beam splitter transmissive to the electromagnetic radiation emitted onto the computer-controlled reticle and reflective to the electromagnetic radiation relayed by the computer-controlled reticle.

58. The apparatus according to claim 57, further comprising a ¼

-wave plate positioned between the beam splitter and the computer-controlled reticle.

59. An apparatus (100) for patterning a work piece (60) arranged at an image plane and sensitive to electromagnetic radiation, comprising:

a source (10) for emitting a beam of electromagnetic radiation,

a beam conditioner unit illuminating an object plane, said unit having an illuminator stop (700) defining the angular spread of the illumination radiation,

a computer controlled reticle at the object plane adapted to modulating the properties of the radiation at each of a multitude of pixels in accordance to an input pattern description, and

a projection system for creating a projected image of said reticle onto a work piece, said system having a spatial filter (70) stop, wherein the illuminator stop and the spatial filter stop define exit pupils which are essentially concentric.

60. The apparatus according to claim 59, wherein the spatial filter operates in a Fourier space and is placed between the computer controlled reticle (30) and the work piece (60).

61. The apparatus according to claim 59, wherein the exit pupils are centered relative to each other.

62. The apparatus according to claim 59, wherein the exit pupils are centered relative to an optical axis of the projection system.

63. An apparatus (100) for patterning a work piece (60) arranged at an image plane and sensitive to electromagnetic radiation, comprising:

a source (10) emitting electromagnetic radiation, illuminating an object plane;

a computer-controlled reticle at the object plane adapted to modulate the electromagnetic radiation at a multitude of pixels in accordance to an input pattern;

a projection system adapted to project an image of said reticle onto a work piece with a predetermined demagnification, said demagnification being adjustable.

64. The apparatus according to claim 63, further including a compound field lens (35, 37, 39) having movable elements, wherein an image distortion at the work piece is adjustable through movement of the elements.

65. The apparatus according to claim 64, wherein the compound field lens includes an air meniscus, the shape of which can be changed.

66. The apparatus according to claim 63, further including a compound tube lens (40, 42, 44) having movable elements, wherein spherical aberration and on-axis coma errors are adjustable through movement of the elements.

67. The apparatus according to claim 66, wherein the compound tube lens includes an air meniscus, the shape of which can be changed.

68. A method for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation, comprising the actions of:

emitting electromagnetic radiation from a source;

conditioning the electromagnetic radiation to have essentially parallel cones of radiation as it impinges on a beamsplitter;

relaying the conditioned electromagnetic radiation from or through the beamsplitter onto a computer-controlled reticle at an object plane;

relaying and diffracting said conditioned electromagnetic radiation from the computer-controlled reticle towards said work piece;

filtering in a Fourier space the relayed and diffracted electromagnetic radiation;

transforming the relayed and diffracted electromagnetic radiation to have essentially parallel central axes of cones of radiation when it impinges on the work piece.