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Method of thin film deposition as an active conductor

  • US 6,631,555 B1
  • Filed: 02/08/2000
  • Issued: 10/14/2003
  • Est. Priority Date: 02/08/2000
  • Status: Expired due to Term
First Claim
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1. A method comprising:

  • filling a substrate cavity with a dielectric material to cover one or more electronic components which are located within the substrate cavity, the dielectric material defining a surface over the one or more electronic components;

    placing the electronic components within a medical device;

    forming an EMI shield within the medical device, wherein forming the EMI shield comprises depositing a thin film of metal on the surface, and at least partially curing the dielectric material before depositing the thin film on the surface.

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