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Method for forming transparent conductive film using chemically amplified resist

  • US 6,632,115 B1
  • Filed: 08/17/2001
  • Issued: 10/14/2003
  • Est. Priority Date: 12/10/1998
  • Status: Expired due to Term
First Claim
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1. A process for forming an ITO film, comprising the steps of:

  • preparing an amorphous ITO film onto a substrate;

    providing a negative chemically amplified photosensitive material directly onto said amorphous ITO film, and exposing and developing said negative chemically amplified photosensitive material to form a pattern of said negative chemically amplified photoresist; and

    treating said amorphous ITO film through said pattern used as a mask.

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