Method for laser thermal processing using thermally induced reflectivity switch

• US 6,635,588 B1
• Filed: 02/19/2002
• Issued: 10/21/2003
• Est. Priority Date: 06/12/2000
• Status: Expired due to Term

• Current Assignee: Veeco Instruments Incorporated
• Original Assignee: Ultratech Stepper, Inc. (Veeco Instruments Incorporated)
• Inventors: Thompson, Michael O., Talwar, Somit, Wang, Yun, Hawryluk, Andrew M.
• Primary Examiner(s): Thompson, Craig
• Application Number:
  US10/078,842
• Time in Patent Office: 609 Days
• Field of Search: 438/795, 438/796-799, 438/511, 438/550, 438/530, 438/166, 438/486, 438/509, 438/535, 438/57, 438/800
• US Class Current: 438/795
• CPC Class Codes: B23K 26/009 using a non-absorbing, e.g. transparent, reflective or refractive, layer on the workpiece using a mask on the workpiece B23K26/066
• CPC Class Codes: B23K 26/18 using absorbing layers on the workpiece, e.g. for marking or protecting purposes
• CPC Class Codes: H01L 21/02532 Silicon, silicon germanium, germanium
• CPC Class Codes: H01L 21/02686 Pulsed laser beam
• CPC Class Codes: H01L 21/02691 Scanning of a beam
• CPC Class Codes: H01L 21/268 using electromagnetic radiation, e.g. laser radiation
• CPC Class Codes: H01L 21/324 Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering H01L21/20 - H01L21/288 and H01L21/302 - H01L21/322 take precedence

Abstract

Method for controlling heat transferred to a workpiece (W) process region (30) from laser radiation (10) using a thermally induced reflectivity switch layer (60). A film stack (6) is formed having an absorber layer (50) atop the workpiece with a portion covering the process region. The absorber layer absorbs and converts laser radiation into heat. Reflective switch layer (60) is deposited atop the absorber layer. The reflective switch layer comprises one or more layers, e.g. thermal insulator and reflectivity transition layers. The reflective switch layer covering the process region has a temperature related to the temperature of the process region. Reflectivity of the switch layer changes from a low to a high reflectivity state at a critical temperature of the process region, limiting radiation absorbed by the absorber layer by reflecting incident radiation when switched. This limits the amount of heat transferred to the process region from the absorber layer.

Claims

1. A method for controlling the amount of heat transferred to a process region of a semiconductor workpiece when exposed to laser radiation, comprising the steps of:

covering one or more process regions of the workpiece with an absorber layer;

forming, atop the absorber layer, a reflectivity switch layer that changes reflectivity at a temperature close to a maximum critical temperature at the workpiece process region;

laser irradiating the reflectivity switch layer; and

stripping the reflectivity switch and absorber layers from the workpiece;

wherein the amount of heat absorbed by the absorber layer from laser radiation incident the absorber layer coming through the reflectivity switch layer, and the heat transferred to the one or more process regions is limited by the reflectivity switch layer changing reflectivity.

2. The method of claim 1, wherein the step of irradiating is performed with laser radiation.

3. The method of claim 2, wherein the laser radiation is pulsed.

4. The method of claim 2, wherein laser radiation is scanned.

5. The method of claim 2, wherein the laser radiation has a wavelength between 500 nm and 1100 nm.

6. The method of claim 1, further includes the step of forming a strippable layer between the absorber layer and the workpiece.

7. The method of claim 6, wherein the strippable layer is formed by depositing silicon dioxide and/or silicon nitride on the workpiece.

8. The method of claim 1, wherein:

the one or more process regions have an activation temperature and the workpiece has a melting temperature; and

the critical temperature of the reflectivity switch layer is higher than the activation temperature and less than the melting temperature.

9. The method of claim 1 wherein at least one of the one or more process regions includes doped amorphous silicon.

10. The method of claim 1, wherein the step of forming the absorber layer includes the step of depositing one or more of the materials from the group of materials comprising:

titanium, titanium nitride, tantalum, tungsten nitride, silicon dioxide and silicon nitride, with the thickness of any of titanium, titanium nitride, tantalum, tungsten nitride in the range of 10 nm to 1000 nm, and the thickness of either of silicon dioxide and silicon nitride in the range of 1 nm to 30 nm.

11. A method for controlling the amount of heat transferred to a process region of a semiconductor workpiece when exposed to laser radiation, comprising the steps of:

covering one or more process regions of the workpiece with an absorber layer of one or more of the materials titanium, titanium nitride, tantalum and tungsten nitride all in a thickness range of 10 nm to 1000 nm and silicon dioxide and silicon nitride in the thickness range of 1 nm to 30 nm;

forming, atop the absorber layer, a reflectivity switch layer, the reflectivity switch layer changing reflectivity at a melting temperature of silicon;

irradiating the workpiece with laser radiation that is absorbed in the absorber layer; and

stripping the reflectivity switch and absorber layers from the workpiece.

12. The method of claim 11 wherein the absorber layer is radiated through the reflectivity switch layer to heat the absorber layer with the heat of the absorber layer being transferred to the one or more process regions and to the reflectivity switch layer.

13. The method of claim 11 wherein the reflectivity switch layer comprises a thermal insulating layer atop the absorber layer and a reflectivity transition layer atop the thermal insulating layer.

14. The method of claim 13 further includes the step of adjusting the thickness of the thermal insulating layer to set a critical temperature.

15. The method of claim 13, wherein the thermal insulating layer is silicon dioxide.

16. The method of claim 13 wherein the reflectivity transition layer is amorphous silicon or polycrystalline silicon.

17. The method of claim 15, wherein the silicon dioxide is deposited to a thickness between about 10 nm and 250 nm.

18. The method of claim 16, wherein the depositing the amorphous silicon or polycrystalline silicon layer has a thickness between about 10 nm and 250 nm.

19. The method of claim 11, wherein the absorber layer receives laser radiation through the reflectivity switch layer when the reflectivity switch layer is in a low-reflectivity state which continues until the reflectivity switch layer switches to a high-reflectivity state.

20. The method of claim 19, wherein the laser radiation has a wavelength between 500 nm and 1100 nm.

21. The method of claim 11 wherein the radiation is pulsed laser radiation.

22. The method of claim 11 wherein the radiation is scanned laser radiation.

23. The method of claim 19 wherein when the reflectivity switch layer is a solid when in the low reflectivity state to a liquid when in the high reflectivity state.

24. The method of claim 19 wherein the one or more process regions have different thermal masses so that portions of the reflectivity switch layer residing over the high thermal mass process regions switch from a low reflectivity state to a high reflectivity state at a different time as compared to those portions of the reflectivity switch layer residing over the low thermal mass process regions.

25. The method of claim 19 wherein the one or more process regions have different reflectivities so that portions of the reflectivity switch layer residing over the high reflectivity process regions switch from a low reflectivity state to a high reflectivity state at a different time as compared to those portions of the reflectivity switch layer residing over the low reflectivity process regions.

30. The method of claim 11 wherein the material of the reflectivity switch layer when in the solid state is transparent to the laser radiation and in the molten state is highly reflective.

26. A method for controlling the amount of heat transferred to a process region of a semiconductor substrate when exposed to laser radiation, comprising the steps of:

providing a substrate with one or more process regions;

covering the one or more process regions with an absorber layer;

covering the absorber layer with a reflectivity switch layer that changes reflectivity from a low-reflectivity state to a high-reflectivity state when the workpiece process region reaches a critical temperature; and

laser irradiating the reflectivity switch layer to bring the workpiece process region to the critical temperature;

wherein the amount of heat absorbed by the absorber layer is from laser radiation incident the absorber layer coming through the reflectivity switch layer, and the heat transferred to the one or more process regions and the reflectivity switch layer is limited when the reflectivity switch layer changes to the high-reflectivity state.

27. The method of claim 26, wherein the laser radiation has a wavelength between 500 nm and 1100 nm.

28. The method of claim 26, wherein the laser radiation is pulsed.

29. The method of claim 26, wherein the laser radiation is scanned.