Multiple beam inspection apparatus and method

• US 6,636,301 B1
• Filed: 08/10/2000
• Issued: 10/21/2003
• Est. Priority Date: 08/10/2000
• Status: Expired due to Term

• Current Assignee: Kla- Tencor
• Original Assignee: KLA-Tencor Corporation (KLA Corporation)
• Inventors: Walsh, Robert W., Kvamme, Damon F.
• Primary Examiner(s): Pham, Hoa Q.
• Application Number:
  US09/636,129
• Time in Patent Office: 1,167 Days
• Field of Search: 356/237.1, 356/237.2, 356/237.3, 356/237.4, 356/237.5, 356/237.6, 356/600, 356/445, 356/446, 250/548, 250/559.3
• US Class Current: 356/237.2
• CPC Class Codes: G01N 2021/95676 Masks, reticles, shadow masks
• CPC Class Codes: G01N 21/8806 Specially adapted optical and illumination features
• CPC Class Codes: G01N 21/9501 Semiconductor wafers manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G01N 21/956 Inspecting patterns on the surface of objects contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10

Abstract

Disclosed is an optical inspection system for inspecting the surface of a substrate. The inspection system includes a light source for emitting a light beam along an optical axis and a first set of optical elements arranged for separating the light beam into a plurality of light beams, directing the plurality of light beams to intersection with the surface of the substrate, and focusing the plurality of light beams to a plurality of scanning spots on the surface of the substrate. The inspection system also includes a second set of optical elements adapted for collecting a plurality of transmitted light beams caused by the intersection of the plurality of light beams with the surface of the substrate and a light detector arrangement including individual light detectors that each receive individual ones of the plurality of transmitted light beams. The light detectors are arranged for sensing the light intensity of the transmitted light beams.

Claims

1. An optical inspection system for inspecting the surface of a substrate, comprising:

a light source for emitting a light beam along an optical axis;

a first set of optical elements arranged for separating the light beam into a plurality of light beams, directing the plurality of light beams to intersection with the surface of the substrate, and focusing the plurality of light beams to a plurality of scanning spots on the surface of the substrate;

a second set of optical elements adapted for collecting a plurality of transmitted light beams caused by the intersection of the plurality of light beams with the surface of the substrate and by passing the plurality of light beams through the substrate, the second set of optical elements including at least a lens arrangement and a prism;

a light detector arrangement including individual light detectors that each receive individual ones of the plurality of transmitted light beams, the light detectors being arranged for sensing the light intensity of the transmitted light beams, wherein the lens arrangement focuses the plurality of transmitted light beams onto the prism, and the prism directs the individual ones of the plurality of transmitted light beams towards the individual light detectors of the light detector arrangement; and

a control system for controlling the optical components of the first and second optical elements, and for receiving scan signals from each of the light detectors of the light detector arrangement.

2. The optical inspection system as recited in claim 1 wherein the lens arrangement includes a first transmitted lens and a spherical aberration correction lens, the first transmitted lens being arranged for collecting and focusing the plurality of transmitted light beams, the spherical aberration correction lens being arranged for maintaining image quality of the plurality of transmitted light beams.

3. The optical inspection system as recited in claim 2 wherein the first transmitted lens and the spherical aberration correction lens are moved along the optical axis to compensate for a varying range of substrate thickness.

4. The optical inspection system as recited in claim 1 wherein the prism includes a plurality of facets that correspond to each of the plurality of transmitted light beams, each facet being arranged for directing an individual one of the plurality of light beams towards a corresponding individual light detector of the light detector arrangement.

5. The optical inspection system as recited in claim 4 wherein the transmitted light optics include an second transmitted lens for focusing the individual ones of the plurality of transmitted light beams onto the corresponding individual light detector of the light detector arrangement.

6. The optical inspection system as recited in claim 1 wherein the second set of optical elements comprises reflected light optics for collecting light that is reflected off the surface of the substrate under inspection.

7. The optical inspection system as recited in claim 6 wherein the reflected light optics include at least a first reflected lens and a prism, wherein the first reflected lens is arranged for focusing the plurality of transmitted light beams onto the prism, and wherein the prism is arranged for directing individual ones of the transmitted light beams towards individual detectors of the light detector arrangement.

8. The optical inspection system as recited in claim 7, wherein the prism includes a plurality of facets that correspond to each of the plurality of reflected light beams, each facet being arranged for directing an individual one of the plurality of light beams towards a corresponding individual light detector of the light detector arrangement.

9. The optical inspection system as recited in claim 8 wherein the reflected light optics further include a second transmitted lens for focusing the individual ones of the plurality of transmitted light beams onto the corresponding individual light detector of the light detector arrangement.

10. The optical inspection system as recited in claim 6 wherein a portion of the first optical elements are included in the reflected light optics.

11. The optical inspection system as recited in claim 6 wherein the optical inspection system is configured to perform reflected light inspection where the amount of light reflected from the substrate is measured via the light detector arrangement.

12. The optical inspection system as recited in claim 6 wherein the optical inspection system is configured to perform simultaneous transmitted and reflected light inspection where the amount of light transmitted through the substrate and the amount of light reflected from the substrate is measured via the light detector arrangement.

13. The system as recited in claim 1 wherein the substrate is a mask, reticle or semiconductor wafer.

14. The system as recited in claim 1 wherein the system is capable of inspecting for defects on the surface of the substrate.

15. The system as recited in claim 1 wherein the first set of optical elements includes a diffraction grating or beam splitter cube.

16. The system as recited in claim 1 wherein the first set of optical elements includes a variable magnification subsystem disposed along the optical axis, the variable magnification subsystem being arranged for controlling the scanning spot size.

17. The optical inspection system as recited in claim 1 wherein the optical inspection system is configured to perform transmitted light inspection where the amount of light transmitted through the substrate is measured via the light detector arrangement.

18. The optical inspection system as recited in claim 1 wherein the first set of optical elements includes a mechanism for sweeping the plurality of light beams so as to move the plurality of scanning spots along the surface of the substrate, the plurality of light beams working together to increase the speed of inspection.

19. An optical inspection system for inspecting a surface of a substrate, comprising:

a transmitted light optical arrangement disposed along an optical axis and including at least a first lens and second lens, both of which are arranged to move along the optical axis, and a prism, which is arranged to move orthogonal to the optical axis, the transmitted light optical arrangement being arranged for directing a plurality of transmitted light beams, which are formed by scanning the substrate with a plurality of light beams, onto a plurality of light detectors; and

a control system for controlling the transmitted light optical arrangement so as to maintain separation of the plurality of beams on the light detectors, the control system including at least a first lens drive, a second lens drive and a prism drive, all of which are coupled to a control interface, which is arranged to control the drives, the first lens drive is arranged to actuate the movement of the first lens, the second lens drive is arranged to actuate the movement of the second lens, and the prism drive is arranged to actuate the movement of the prism.

20. The optical inspection system as recited in claim 19 wherein the first lens, the second lens and the prism each have nominal positions, which are based at least in part on the magnification level of the plurality of beams.

21. The optical inspection system as recited in claim 19 wherein the first lens, the second lens and the prism each have nominal positions, which are based at least in part on the thickness of the substrate.

22. The optical inspection system as recited in claim 21 wherein the nominal positions of the first lens and the prism are calibrated for each substrate to be inspected, and wherein the calibrated positions are based at least in part on measured cross talk values.

23. The optical inspection system as recited in claim 22 wherein the calibration is performed automatically, without information or assistance from an operator.

24. The optical inspection system as recited in claim 19 wherein the first lens is arranged to track the surface of the substrate during inspection.

25. The optical inspection system as recited in claim 24 wherein the tracking is calibrated and performed automatically, without information or assistance from an operator.

26. The system as recited in claim 19 wherein the substrate is a mask, reticle or semiconductor wafer.