MEMS structure with mechanical overdeflection limiter

• US 6,641,273 B1
• Filed: 06/28/2002
• Issued: 11/04/2003
• Est. Priority Date: 06/28/2002
• Status: Active Grant

• Current Assignee: DiCon Fiber Optics Incorporated
• Original Assignee: Glimmerglass Network Incorporated
• Inventors: Spallas, James P., Muray, Lawrence P., Fernandez, Andres, Staker, Bryan P.
• Primary Examiner(s): SIKDER, MOHAMMAD YUNUS
• Application Number:
  US10/186,566
• Time in Patent Office: 494 Days
• Field of Search: 359/876, 359/877, 359/224, 359/225, 359/226, 359/221, 359/220, 359/291, 359/872, 359/847, 359/298
• US Class Current: 359/876
• CPC Class Codes: B81B 2201/042 Micromirrors, not used as optical switches
• CPC Class Codes: B81B 3/0051 For defining the movement, i.e. structures that guide or limit the movement of an element mechanical arrangements for preventing or damping vibration or shock H01H3/60
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means

Abstract

A MEMS device having a fixed element and a movable element wherein one or the other of the fixed element and the movable element has at least one radially-extended stop or overdeflection limiter. A fixed overlayer plate forms an aperture. The aperture is sized to minimize vignetting and may be beveled on the margin. Overdeflection limitation occurs during deflection before the movable element can impinge on an underlying electrode. The overdeflection limiter may be conveniently placed adjacent a gimbaled hinge.

Claims

1. A double-gimbaled micromachined mirror structure for parallel-plate electrostatic operation, said mirror structure comprising:

a frame;

a mirror;

a gimbal around said mirror;

a plurality of hinge structures at four positions on said gimbal, a first pair of said hinge structures connecting said mirror to said gimbal and a second pair of said hinge structures connecting said frame to said gimbal, said hinge structures permitting motion substantially only normal to said mirror and wherein adjacent each element of said first pair is a gimbal wraparound for serving as rotational displacement limitation; and

overhanging structure adjacent each of said four positions and disposed to confront each said gimbal wraparound to limit rotational displacement of said mirror.

2. The apparatus according to claim 1 wherein said overhanging structure and said mirror are maintained in sufficient differential in potential to permit detection of contact of said substrate and said mirror through detection of voltage change.

3. The apparatus according to claim 1 wherein said overhanging structure and said mirror are maintained in sufficient differential in potential to permit detection of contact of said substrate and said mirror through detection of current change.

4. The apparatus according to claim 1 wherein said overhanging structure and said mirror are maintained in equipotential.

5. The apparatus a according to claim 1 wherein said detectable differential is sufficiently small to inhibit arcing upon contact between said mirror and said overhang.

6. The apparatus according to claim 1 wherein near each element of said second pair is a tab extension from said overhanging structure for serving as rotational displacement limitation on said mirror.

7. The apparatus according to claim 1 wherein said overhanging structure is disposed to provide a clear aperture at all design viewing angles of said mirror.

8. The apparatus according to claim 1 wherein said overhanging structure is disposed over said mirror and mounted on a flipped SOI handle structure.

9. The apparatus according to claim 1 wherein said overhanging structure is disposed over said mirror and formed in a bevel etched by potassium hydroxide.

10. The apparatus according to claim 1 wherein said overhanging structure is disposed over said mirror and formed of a thinned silicon wafer.

11. The apparatus according to claim 1 wherein said hinge structures are folded longitudinal gimbal hinge structures.