Substrate processing using a member comprising an oxide of a group IIIB metal
First Claim
1. An erosion resistant member that is used in the processing of a substrate in a plasma of a processing gas, the member comprising at least a portion that is exposed to the plasma of the processing gas, said portion comprising more than about 3% by weight of an oxide of a Group IIIB metal.
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Abstract
An erosion resistant member that may be used in the processing of a substrate in a plasma of a processing gas, comprises at least a portion that may be exposed to the plasma of the processing gas and that contains more than about 3% by weight of an oxide of a Group IIIB metal. The portion may also further contain a ceramic compound selected from silicon carbide, silicon nitride, boron carbide, boron nitride, aluminum nitride, aluminum oxide, and mixtures thereof.
59 Citations
19 Claims
- 1. An erosion resistant member that is used in the processing of a substrate in a plasma of a processing gas, the member comprising at least a portion that is exposed to the plasma of the processing gas, said portion comprising more than about 3% by weight of an oxide of a Group IIIB metal.
- 13. An erosion resistant member that is used in the processing of a substrate in a plasma of an etchant gas, the member comprising at least a portion that is exposed to the plasma of the etchant gas, said portion comprising (i) more than about 3% by weight of yttrium oxide and (ii) aluminum oxide.
Specification