Method of manufacturing material for forming insulating film

• US 6,642,352 B2
• Filed: 01/17/2001
• Issued: 11/04/2003
• Est. Priority Date: 01/17/2000
• Status: Expired due to Fees

• Current Assignee: JSR Corporation
• Original Assignee: JSR Corporation
• Inventors: Suzuki, Hidenori, Nakase, Yoshihisa, Kakinoki, Katsuyuki, Okada, Takashi, Yamada, Kinji, Nishikawa, Michinori
• Primary Examiner(s): Seidleck, James J.
• Assistant Examiner(s): RAJGURU, UMAKANT K
• Application Number:
  US09/760,784
• Publication Number:
  US 20010009936A1
• Time in Patent Office: 1,021 Days
• Field of Search: 525/326.1, 528/502, 210/767
• US Class Current: 528/502.00R
• CPC Class Codes: C08G 77/34 Purification
• CPC Class Codes: H01B 3/42 polyesters; polyethers; polyacetals
• CPC Class Codes: H01B 3/442 from aromatic vinyl compounds
• CPC Class Codes: H01B 3/46 silicones

Abstract

A method of manufacturing an insulating film-forming material comprising a curable composition comprisING (A) an inorganic polymer compound or an organic polymer compound and (B) an organic solvent, which comprises treating the curable composition with a zeta potential-producing filter material. Because the curable composition has a very small content of alkali metals and heavy metals, the composition is suitably used for the manufacture of materials for forming insulating films which have a wide variety of applications in the electronic field.

Claims

1. A method of manufacturing an insulating film-forming material comprising:

treating a curable composition which comprises (A) a polymer selected from the group consisting of a hydrolysis condensate of at least one compound selected from the group consisting of compounds (A-1) and (A-2) which are respectively the following formulas (1) or (2);

2. The method according to claim 1, wherein said zeta potential-producing filter material is filter material selected from the group consisting of cotton, pulp, cellulose, diatomite, pearlite, activated carbon, and zeolite with a cation charge modifier added thereto.

3. The method according to claim 1, wherein said zeta potential-producing filter material is used together with an ion exchanger material or a chelate-forming material, or both.

4. The method according to claim 1, wherein said curable composition further comprises (C) a compound having a boiling point or decomposition temperature of 250-450°

C.

5. The method according to claim 1, wherein said curable composition further comprises (D) a compound having a boiling point or decomposition temperature of above 450°

C.

6. The method according to claim 1, wherein said curable composition further comprises (E) a surfactant.

10. The method according to claim 1, wherein said filter contains a cation charge modifier.

11. The method according to claim 1, wherein said filter has a thickness from 0.01 to 10cm and a pore diameter of from 0.05 to 10.0 μ

m.

12. The method according to claim 1, wherein said monovalent organic group is selected from the group consisting of alkyl groups, aryl groups, allyl groups and glycidyl groups.

7. The method of manufacturing an insulating film-forming material comprising a curable composition which comprises (A) a polymer selected from the group consisting of a hydrolysis condensate of at least one compound selected from the group consisting of compounds (A-1) and (A-2) which are respectively the following formulas (1) or (2):

8. A method of manufacturing an insulating film-forming material comprising a curable composition which comprises (A) a polymer selected from the group consisting of a hydrolysis condensate of at least one compound selected from the group consisting of compounds (A-1) and (A-2) which are respectively the following formulas (1) or (2):

9. The method of manufacturing an insulating film-forming material comprising a curable composition which comprises (A) a polymer selected from the group consisting of organic polymers, excluding homopolymers and copolymers of vinyl phenol, and inorganic polymers, a hydrolysis condensate of at least one compound selected from the group consisting of compounds (A-1) and (A-2) which are respectively the following formulas (1) or (2):