Delivery of dissolved ozone
First Claim
Patent Images
1. A method for stripping a layer from a semiconductor wafer, the method comprising:
- introducing ozone into a process chamber;
activating a water spray with water from a selector valve for a first predetermined amount of time, thereby creating a water layer over a layer of a semiconductor wafer, wherein the water layer transports concentrations of the ozone to the semiconductor wafer;
deactivating the water spray for a second predetermined amount of time, thereby controlling a thickness of the water layer, wherein during the deactivating, the selector valve redirects the water to allow continuous water flow through the selector valve; and
re-activating and re-deactivating the water spray with the selector valve until the ozone substantially removes portions of the layer from the semiconductor wafer.
7 Assignments
0 Petitions
Accused Products
Abstract
An apparatus and method for delivering ozone to a workpiece. In one embodiment, fluid is sprayed onto a workpiece placed in an ozone-rich environment. Alternatively, ozone is mixed with the fluid prior to spraying the fluid onto the workpiece. When spraying the fluid, the invention pulses the fluid at desired rates to create a substantially uniform layer of ozone-rich fluid on the workpiece. In another embodiment, the workpiece is also slowly rotated during at least a portion of the time the layer of ozone-rich fluid is applied to the workpiece.
43 Citations
23 Claims
-
1. A method for stripping a layer from a semiconductor wafer, the method comprising:
-
introducing ozone into a process chamber;
activating a water spray with water from a selector valve for a first predetermined amount of time, thereby creating a water layer over a layer of a semiconductor wafer, wherein the water layer transports concentrations of the ozone to the semiconductor wafer;
deactivating the water spray for a second predetermined amount of time, thereby controlling a thickness of the water layer, wherein during the deactivating, the selector valve redirects the water to allow continuous water flow through the selector valve; and
re-activating and re-deactivating the water spray with the selector valve until the ozone substantially removes portions of the layer from the semiconductor wafer. - View Dependent Claims (2, 3, 4, 5)
-
-
6. A method of removing unwanted material from a semiconductor workpiece, the method comprising:
-
providing a semiconductor workpiece in a reaction chamber, wherein the semiconductor workpiece includes unwanted material;
adding a reactive gas to the reaction chamber with unwanted material;
rotating the semiconductor workpiece;
activating a fluid spray within the reaction chamber with fluid from a valve;
deactivating the fluid spray within the reaction chamber wherein during the deactivating, the valve redirects the fluid flow; and
repeating the activating and the deactivating of the fluid spray while rotating the semiconductor workpiece, wherein the rotating and the activating and deactivating control a layer of the fluid spray over the semiconductor workpiece in a manner enhancing the reaction of the reactive gas with the unwanted material. - View Dependent Claims (7, 8, 9, 10)
-
-
11. A method of removing unwanted material from a workpiece, the method comprising:
-
providing a workpiece in a process chamber, wherein the workpiece includes a semiconductor including unwanted material;
adding ozone to the process chamber to react with the unwanted material;
rotating the workpiece; and
removing unwanted material from a workpiece by pulsing fluid over the workpiece with fluid from a valve, wherein the value allows fluid flow to continue during the pulsing, wherein the rotating and the pulsing control a layer of the fluid over the semiconductor in a manner enhancing the reaction of the ozone with the unwanted material. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
-
Specification