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Characterizing kernel function in photolithography based on photoresist pattern

  • US 6,647,137 B1
  • Filed: 07/10/2000
  • Issued: 11/11/2003
  • Est. Priority Date: 07/10/2000
  • Status: Expired due to Fees
First Claim
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1. A method of determining a range of a kernel function of a lithographic system comprising:

  • exposing, in said lithographic system, a photosensitive layer on a top surface of a substrate through a mask having a mask image, said mask image being of sufficient width to ensure a transferred image will not exhibit foreshortening but will exhibit corner rounding;

    developing said photosensitive layer to form said transferred image in said photosensitive layer;

    measuring a distance from an intersection of projected extensions of edges of said transferred image to a point along one edge where corner rounding starts; and

    defining said range of said kernel function as said measured distance.

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