Capacitive humidity sensor

• US 6,647,782 B2
• Filed: 07/15/2002
• Issued: 11/18/2003
• Est. Priority Date: 07/16/2001
• Status: Expired due to Fees

• Current Assignee: DENSO Corporation
• Original Assignee: DENSO Corporation
• Inventors: Toyoda, Inao
• Primary Examiner(s): Lefkowitz, Edward
• Assistant Examiner(s): CYGAN, MICHAEL T
• Application Number:
  US10/194,305
• Publication Number:
  US 20030010119A1
• Time in Patent Office: 491 Days
• Field of Search: 733/350.4, 733/350.2, 733/350.3, 73/290.5, 257/252, 257/253, 361/286, 329/71.1
• US Class Current: 73/335.04
• CPC Class Codes: G01N 27/225 by using hygroscopic materials

Abstract

A humidity sensor has two detection electrodes located on a semiconductor substrate and a humidity sensitive film. The capacitance of the film changes in response to humidity. The sensor includes a reference capacitor and a feedback capacitor. An electrode of each capacitor is located beneath one of the detection electrodes to limit the size of the device.

Claims

1. A capacitive humidity sensor comprising:

a semiconductor substrate;

circuit devices formed on a surface of the semiconductor substrate;

two detection electrodes, which are isolated from one another and are opposed to one other, wherein the detection electrodes are formed on the surface of the semiconductor substrate; and

a humidity-sensitive film, the capacitance of which changes in response to humidity, placed between the detection electrodes and formed on the surface of the semiconductor substrate, wherein;

the capacitance between the detection electrodes changes in response to changes in the surrounding humidity;

the circuit devices make up switched capacitor circuits comprising a reference capacitor and feedback capacitor that convert changes in capacitance between the detection electrodes into voltage signal output; and

at least one of the reference capacitor and the feedback capacitor is an underlying capacitor and is located beneath one of the detection electrodes.

2. The capacitive humidity sensor of claim 1, further comprising an insulating film, wherein the underlying capacitor is formed by forming one electrode of the underlying capacitor beneath the one electrode for detection such that the one electrode of the underlying capacitor faces the one detection electrode across an insulating film.

3. The capacitive humidity sensor of claim 2, wherein the one electrode of the underlying capacitor is made of polysilicon.

4. The sensor of claim 3, wherein the circuit devices comprise:

MOS transistors, which are parts of the switched capacitor circuits; and

gate electrodes, wherein the gate electrodes include polysilicon.

5. The capacitive humidity sensor of claim 2, wherein the one electrode of the underlying capacitor is formed with a diffusion layer that is formed at the surface of the semiconductor substrate.

6. The capacitive humidity sensor of claim 1, wherein each of the detection electrodes is comb shaped and has tooth like parts, and the tooth-like parts of one of the detection electrodes are interdigitated with the tooth-like parts of the other detection electrode.

7. A capacitive humidity sensor comprising:

a semiconductor substrate;

circuit devices formed on a surface of the semiconductor substrate;

a first insulating film formed on the surface of the semiconductor substrate;

two detection electrodes formed in isolation from each other and opposed to each other on the first insulating film;

a second insulating film formed to cover the detection electrodes; and

a humidity-sensitive film, the capacitance of which changes in response to humidity, formed on the second insulating film to cover the detection electrodes and an area between the detection electrodes, wherein;

the capacitance between the detection electrodes changes in response to changes in surrounding humidity;

the circuit devices make up switched capacitor circuits comprising a reference capacitor and a feedback capacitor for converting changes in capacitance between the detection electrodes into voltage signal output; and

at least one of the reference capacitor and the feedback capacitor is an underlying capacitor that is formed beneath one of the detection electrodes.

8. The capacitive humidity sensor of claim 7, wherein the underlying capacitor is formed by forming an electrode of the underlying capacitor beneath the one detection electrode such that the electrode of the underlying capacitor faces the one detection electrode across the first insulating film.

9. The capacitive humidity sensor of claim 8, wherein the one electrode of the underlying capacitor is made of polysilicon.

10. The sensor of claim 9, wherein the circuit devices comprise:

MOS transistors, which are parts of the switched capacitor circuits; and

gate electrodes, wherein the gate electrodes include polysilicon.

11. The capacitive humidity sensor of claim 8, wherein the one electrode of the underlying capacitor is formed with a diffusion layer that is formed at the surface of the semiconductor substrate.

12. The capacitive humidity sensor of claim 7, wherein each of the detection electrodes is comb shaped and has tooth like parts, and the tooth-like parts of one of the detection electrodes are interdigitated with the tooth-like parts of the other detection electrode.