System and method to control planar motors

• US 6,650,079 B2
• Filed: 06/01/2001
• Issued: 11/18/2003
• Est. Priority Date: 06/01/2001
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Binnard, Michael B.
• Primary Examiner(s): Ro, Bentsu
• Application Number:
  US09/870,753
• Publication Number:
  US 20020180395A1
• Time in Patent Office: 900 Days
• Field of Search: 318/648, 318/649, 318/632, 318/653, 318/687, 310/12, 744/71.XY
• US Class Current: 318/649
• CPC Class Codes: H02K 2201/18 Machines moving with multiple degrees of freedom
• CPC Class Codes: H02K 41/03 Synchronous motors; Motors moving step by step; Reluctance motors H02K41/035 takes precedence
• CPC Class Codes: H02P 6/006 Controlling linear motors
• CPC Class Codes: Y10T 74/20201 Control moves in two planes

Abstract

A method for controlling and positioning a two-dimensional electric motor is disclosed. The electric motor has a coil array and a magnet array. The method controls the motor in two directions in the plane of the magnet array and about a third direction generally orthogonal to the plane. The method includes: determining currents for generating the desired forces, determining a resultant torque that would be generated from applying the determined currents, determining current adjustments to compensate for the resultant torque, and applying a current equal to the sum of the determined currents and the current adjustments to the coils to interact with the magnetic fields of the magnet array. The currents are applied to the portion of the coil array within the magnetic field of the magnet array, including those coils which are only partially within the magnetic field of the magnet array. Alternatively, the currents could be applied to all of the coils. Applying the current to all of the coils requires more electrical power, but uses for amplifiers so the electronics are simpler and less expensive. The method of the present invention may be used in applications such as positioning wafers in semiconductor fabrication.

Claims

1. A method for controlling a planar electric motor comprising a magnet array having magnets with magnetic fields and a coil array comprising coils generally disposed in a plane, comprising:

determining currents to be applied to coils to generate forces between the magnet array and the coil array in first and second directions;

determining a resultant torque between the magnet array and the coil array generated by the forces generated by the determined currents;

determining current adjustments to compensate for the resultant torque such that a total torque between the magnet array and the coil array becomes a desired value; and

applying a sum of the determined currents and determined current adjustments to the coils to interact with the magnetic fields of the magnet array to control the planar electric motor.

2. The method for controlling a planar electric motor of claim 1, wherein the magnetic fields of the magnet array are adjacent to a portion of the coil array.

3. The method for controlling a planar electric motor of claim 2, wherein the current adjustments are determined for each coil in the portion of the coil array.

4. The method for controlling a planar electric motor of claim 2, wherein currents to be applied to the coils is determined only for coils in the portion of the coil array.

5. The method for controlling a planar electric motor of claim 2, wherein the sum of the determined currents and determined current adjustments to the coils is applied only to coils in the portion of the coil array.

6. The method for controlling a planar electric motor of claim 5, wherein the coils in the portion of the coil array includes coils partially within the magnetic fields of the magnet array.

7. The method for controlling a planar electric motor of claim 1, wherein the magnet array is at least as large as eight coils of the coil array.

8. The method for controlling a planar electric motor of claim 1, further comprising determining the position of the magnet array relative to the coil array and using the position of the magnet array in determining currents, resultant torque or current adjustments.

9. The method for controlling a planar electric motor of claim 1, wherein currents to be applied to coils in a predetermined portion of the coil array are sinusoidal, triangular or square waveforms.

10. The method for controlling a planar electric motor of claim 1, further comprising determining forces to be generated between the magnet array and the coil array in the first and second directions to result in forces in the first and second directions or torque about a third direction, generally orthogonal to the first and second directions.

11. The method for controlling a planar electric motor of claim 1, wherein the current adjustments are determined such that a total force between the magnet array and the coil array remains the same.

12. A method for determining current to be applied to control a planar electric motor, the motor having a magnet array and a coil array having coils generally disposed in a plane, comprising:

determining currents to be applied to coils for generating forces between the magnet array and the coil array in first and second directions defined by the plane, the currents being dependent upon the position of the magnet array and desired forces in the first and second directions or torque about a third direction generally perpendicular to the first and second directions;

determining a resultant torque that would be generated by the currents; and

determining current adjustments to be added to the currents to compensate for the resultant toque such that a total torque between the magnet array and the coil array becomes a desired value.

13. The method for determining current to be applied to control a planar electric motor of claim 12, further comprising determining a sum of the determined currents and determined current adjustments.

14. The method for determining current to be applied to control a planar electric motor of claim 12, wherein the currents are determined only for coils in a predetermined portion of the coil array within a magnetic field of the magnet array.

15. The method for determining current to be applied to control a planar electric motor of claim 14, wherein the coils in the portion of the coil array includes coils partially within the magnetic fields of the magnet array.

16. The method for determining current to be applied to control a planar electric motor of claim 12, wherein the current adjustments are determined such that a total force between the magnet array and the coil array remains the same.

17. A method for positioning a wafer in a lithography system, comprising:

providing a frame;

providing a stage for supporting the wafer and movable to position the wafer relative to the frame;

providing a coil array attached to the frame, the coil array having coils;

providing a magnet array adjacent a portion of the coil array, the magnet array being attached to the stage and having magnets generally disposed in a plane, the plane defining first and second directions;

determining current to be applied to coils in the portion of coil array to generate forces between the magnet array and the coil array in the first and second directions;

determining a resultant toque between the magnet array and the coil array generated by the forces;

determining current adjustments to compensate for the resultant torque such that a total torque between the magnet array and the coil array becomes a desired value; and

applying a sum of the determined currents and determined current adjustments to the coils to interact with magnetic fields of the magnet array.

18. The method for positioning a wafer in a lithography system according to claim 17, further comprising determining position of the magnet array relative to the coil array and using the position of the magnet array in determining currents, resultant torque or current adjustments.

19. The method for positioning a wafer in a lithography system according to claim 17, wherein currents to be applied to coils in the portion of the coil array are sinusoidal, triangular or square waveforms.

20. The method for positioning a wafer in a lithography system according to claim 17, further comprising determining forces to be generated between the magnet array and the coil array in the first and second directions to result in forces in the first and second directions or torque about a third direction, generally orthogonal to the first and second directions.

21. The method for positioning a wafer in a lithography system according to claim 17, wherein the current adjustments are determined for each coil in the portion of the coil array.

22. The method for positioning a wafer in a lithography system according to claim 17, wherein currents to be applied to the coils are determined only for coils in the portion of the coil array.

23. The method for positioning a wafer in a lithography system according to claim 17, where in the sum of the determined currents and determined current adjustments to the coils is applied only to coils in the portion of the coil array.

24. The method for positioning a wafer in a lithography system according to claim 23, wherein the coils in the portion of the coil array include coils partially within the magnetic fields of the magnet array.

25. A method for making a wafer utilizing the positioning method of claim 17.

26. A method for making a device including at least the exposure process, wherein the exposure process uses the lithography system utilizing the method of claim 17.

27. The method for positioning a wafer in a lithography system according to claim 17, wherein the current adjustments are determined such that a total force between the magnet array and the coil array remains the same.

28. A planar motor comprising:

a first member;

a second member interacting with the first member to generate driving force, the second member being movable relative to the first member in at least two directions by the driving force; and

a controller connected to at least one of the first and second members, the controller determining information related to a resultant torque between the first and second members generated by the driving force, the controller determining adjustment information to compensate for the resultant torque such that a total torque between the first and second members becomes a desired value.

29. The planar motor of claim 28, further comprising a measuring system connected to the controller, the measuring system detecting information related to the relative position between the first member and the second member;

and wherein the controller determines the resultant torque based on the information related to the relative position between the first member and the second member.

30. The planar motor of claim 28, wherein the controller outputs the adjustment information to at least one of the first and second members to generate force for compensation of the resultant torque such that the total torque between the first and second members becomes the desired value.

31. The planar motor of claim 28, wherein the first member includes a magnet array having magnets and the second member includes a coil array having coils generally disposed in a plane, the plane defining a first and second direction and the direction of the driving force is substantially the same as the first and second direction.

32. The planar motor of claim 31, wherein the adjustment information includes current adjustment information.

33. A stage assembly including the planar motor of claim 28.

34. A lithography system including the stage assembly of claim 33.

35. A device manufactured with the lithography system of claim 34.

36. A device manufactured with the stage assembly of claim 33.

37. The planar motor of claim 28, wherein the controller determines the adjustment information such that a total force between the first and second members remains the same.