Method and apparatus for determining column dimensions using scatterometry

• US 6,650,423 B1
• Filed: 07/02/2001
• Issued: 11/18/2003
• Est. Priority Date: 07/02/2001
• Status: Expired due to Fees

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Lensing, Kevin R., Markle, Richard J., Stirton, J. Broc, Wright, Marilyn I.
• Primary Examiner(s): Font, Frank G.
• Assistant Examiner(s): Nguyen, Sang H.
• Application Number:
  US09/897,623
• Time in Patent Office: 869 Days
• Field of Search: 356/601, 356/237.1, 356/237.6, 356/388, 356/392, 356/394, 356/625, 356/636, 438/6-8, 438/12, 438/14-16, 438/18, 438/401, 438/402, 250/306, 324/719, 324/765
• US Class Current: 356/601
• CPC Class Codes: G01B 11/00 Measuring arrangements characterised by the use of optical techniques

Abstract

A test structure includes a plurality of trenches and a plurality of columns defined in the trenches. A method for determining column dimensions includes providing a wafer having a test structure comprising a plurality of trenches and a plurality of columns defined in the trenches; illuminating at least a portion of the columns with a light source; measuring light reflected from the illuminated portion of the columns to generate a reflection profile; and determining a dimension of the columns based on the reflection profile. A metrology tool adapted to receive a wafer having a test structure comprising a plurality of trenches and a plurality of columns defined in the trenches includes a light source, a detector, and a data processing unit. The light source is adapted to illuminate at least a portion of the columns. The detector is adapted to measure light reflected from the illuminated portion of the columns to generate a reflection profile. The data processing unit is adapted to determine a dimension of the columns based on the reflection profile.

Claims

1. A method for determining column dimensions, comprising:

providing a wafer having a test structure comprising a plurality of trenches each having a width dimension, and a plurality of columns defined in the trenches, each column having a width dimension less than the width dimension of the trench in which it is defined;

illuminating at least a portion of the columns with a light source;

measuring light reflected from the illuminated portion of the columns to generate a reflection profile; and

determining a dimension of the columns based on the reflection profile.

2. The method of claim 1, wherein determining the dimension of the columns further comprises:

comparing the generated reflection profile to a library of reference reflection profiles, each reference reflection profile having an associated column dimension metric;

selecting a reference reflection profile closest to the generated reflection profile; and

determining the dimension of the columns based on the column dimension metric associated with the selected reference reflection profile.

3. The method of claim 1, further comprising determining at least one parameter of an operating recipe of a etch tool adapted to etch a subsequent wafer based on the determined column dimension.

4. The method of claim 3, wherein determining at least one parameter of the operating recipe of the etch tool comprises determining at least one of an etch time parameter, a plasma chemical composition parameter, an RF power parameter, a gas flow parameter, a chamber temperature parameter, a chamber pressure parameter, and an end-point signal parameter.

5. The method of claim 1, further comprising determining at least one parameter of an operating recipe of a photolithography tool adapted to process a subsequent wafer based on the determined column dimension.

6. The method of claim 5, wherein determining at least one parameter of the operating recipe of the photolithography tool comprises determining at least one of an exposure time parameter, an exposure dose parameter, a depth of focus parameter, a resist spin speed parameter, a soft bake temperature parameter, a post exposure bake temperature parameter, a cool plate temperature parameter, a developer temperature parameter, and a focus tilt parameter.

7. The method of claim 1, wherein generating the reflection profile comprises generating the reflection profile based on at least one of intensity and phase of the reflected light.

8. The method of claim 1, wherein determining the dimension of the columns further comprises:

comparing the generated reflection profile to a target reflection profile; and

determining the dimension of the columns based on the comparison of the generated reflection profile and the target reflection profile.

9. The method of claim 1, further comprising identifying a fault condition associated with the columns based on the determined column dimension.

10. The method of claim 1, wherein determining the dimension of the columns further comprises determining at least one of a diameter dimension, a height dimension, and a sidewall angle dimension.

11. The method of claim 1, wherein providing the wafer further comprises providing the wafer having the test structure comprising the plurality of trenches and the plurality of columns defined in the trenches, the columns in one trench being aligned with the columns in an adjacent trench.

12. The method of claim 1, wherein providing the wafer further comprises providing the wafer having the test structure comprising the plurality of trenches and the plurality of columns defined in the trenches, the columns in one trench being offset with respect to the columns in an adjacent trench.

13. A method for determining columns dimensions, comprising:

providing a wafer having a test structure comprising a plurality of trenches each having a width dimension, and a plurality of columns defined in the trenches, each column having a width dimension less than the width dimension of the trench in which it is defined;

illuminating at least a portion of the columns with a light source;

measuring light reflected from the illuminated portion of the columns to generate a reflection profile;

comparing the generated reflection profile to a library of reference reflection profiles each reference reflection profile having an associated column dimension metric;

selecting a reference reflection profile closest to the generated reflection profile; and

determining a dimension of the columns based on the column dimension metric associated with the selected reference reflection profile.

14. The method of claim 13, further comprising determining at least one parameter of an operating recipe of a etch tool adapted to etch a subsequent wafer based on the determined column dimension.

15. The method of claim 14, wherein determining at least one parameter of the operating recipe of the etch tool comprises determining at least one of an etch time parameter, a plasma chemical composition parameter, an RF power parameter, a gas flow parameter, a chamber temperature parameter, a chamber pressure parameter, and an end-point signal parameter.

16. The method of claim 13, further comprising determining at least one parameter of an operating recipe of a photolithography tool adapted to process a subsequent wafer based on the determined column dimension.

17. The method of claim 16, wherein determining at least one parameter of the operating recipe of the photolithography tool comprises determining at least one of an exposure time parameter, an exposure dose parameter, a depth of focus parameter, a resist spin speed parameter, a soft bake temperature parameter, a post exposure bake temperature parameter, a cool plate temperature parameter, a developer temperature parameter, and a focus tilt parameter.

18. The method of claim 13, wherein generating the reflection profile comprises generating the reflection profile based on at least one of intensity and phase of the reflected light.

19. The method of claim 13, further comprising identifying a fault condition associated with the columns based on the determined column dimension.

20. The method of claim 13, wherein determining the dimension of the columns further comprises determining at least one of a diameter dimension, a height dimension, and a sidewall angle dimension.

21. The method of claim 13, wherein providing the wafer further comprises providing the wafer having the test structure comprising the plurality of trenches and the plurality of columns defined in the trenches, the columns in one trench being aligned with the columns in an adjacent trench.

22. The method of claim 13, wherein providing the wafer further comprises providing the wafer having the test structure comprising the plurality of trenches and the plurality of columns defined in the trenches, the columns in one trench being offset with respect to the columns in an adjacent trench.

23. A method for determining column dimensions, comprising:

providing a wafer having a test structure comprising a plurality of trenches each having a width dimension, and a plurality of columns defined in the trenches, each column having a width dimension less than the width dimension of the trench in which it is defined;

illuminating at least a portion of the columns with a light source;

measuring light reflected from the illuminated portion of the columns to generate a reflection profile; and

comparing the generated reflection profile to a target reflection profile; and

determining a dimension of the columns based the comparison of the generated reflection profile and the target reflection profile.

24. The method of claim 23, further comprising determining at least one parameter of an operating recipe of a etch tool adapted to etch a subsequent wafer based on the determined column dimension.

25. The method of claim 24, wherein determining at least one parameter of the operating recipe of the etch tool comprises determining at least one of an etch time parameter, a plasma chemical composition parameter, an RF power parameter, a gas flow parameter, a chamber temperature parameter, a chamber pressure parameter, and an end-point signal parameter.

26. The method of claim 23, further comprising determining at least one parameter of an operating recipe of a photolithography tool adapted to process a subsequent wafer based on the determined column dimension.

27. The method of claim 26, wherein determining at least one parameter of the operating recipe of the photolithography tool comprises determining at least one of an exposure time parameter, an exposure dose parameter, a depth of focus parameter, a resist spin speed parameter, a soft bake temperature parameter, a post exposure bake temperature parameter, a cool plate temperature parameter, a developer temperature parameter, and a focus tilt parameter.

28. The method of claim 23, wherein generating the reflection profile comprises generating the reflection profile based on at least one of intensity and phase of the reflected light.

29. The method of claim 23, further comprising identifying a fault condition associated with the columns based on the determined column dimension.

30. The method of claim 23, wherein determining the dimension of the columns further comprises determining at least one of a diameter dimension, a height dimension, and a sidewall angle dimension.

31. The method of claim 23, wherein providing the wafer further comprises providing the wafer having the test structure comprising the plurality of trenches and the plurality of columns defined in the trenches, the columns in one trench being aligned with the columns in an adjacent trench.

32. The method of claim 23, wherein providing the wafer further comprises providing the wafer having the test structure comprising the plurality of trenches and the plurality of columns defined in the trenches, the columns in one trench being offset with respect to the columns in an adjacent trench.

33. A metrology tool adapted to receive a wafer having a test structure comprising a plurality of trenches each having a width dimension, and a plurality of columns defined in the trenches, comprising:

a light source adapted to illuminate at least a portion of the columns, each column having a width dimension less than the width dimension of the trench in which it is defined;

a detector adapted to measure light reflected from the illuminated portion of the columns to generate a reflection profile; and

a data processing unit adapted to determine a dimension of the columns based on the reflection profile.

34. The metrology tool of claim 33, wherein the data processing unit is further adapted to compare the generated reflection profile to a library of reference reflection profiles, each reference reflection profile having an associated column dimension metric, select a reference reflection profile closest to the generated reflection profile, and determine the dimension of the columns based on the column dimension metric associated with the selected reference reflection profile.

35. The metrology tool of claim 33, wherein the detector is further adapted to generate the reflection profile based on at least one of intensity and phase of the reflected light.

36. The metrology tool of claim 33, wherein the metrology tool comprises at least one of a scatterometer, an ellipsometer, and a reflectometer.

37. The metrology tool of claim 33, wherein the data processing unit is further adapted to compare the generated reflection profile to a target reflection profile and determine the dimension of the columns based on the comparison of the generated reflection profile and the target reflection profile.

38. The metrology tool of claim 33, wherein the columns in one trench are aligned with the columns in an adjacent trench.

39. The metrology tool of claim 33, wherein the columns in one trench are offset with respect to the columns in an adjacent trench.

40. A processing line, comprising:

a processing tool adapted to process wafer in accordance with an operating recipe;

a metrology tool adapted to receive a wafer having a test structure comprising a plurality of trenches each having a width dimension, and a plurality of columns defined in the trenches, each column having a width dimension less than the width dimension of the trench in which it is defined, the metrology tool comprising;

a light source adapted to illuminate at least a portion of the columns;

a detector adapted to measure light reflected from the illuminated portion of the columns to generate a reflection profile; and

a data processing unit adapted determine a dimension of the columns based on the reflection profile; and

a controller adapted to determine at least one parameter of the operating recipe of the processing tool based on the determined column dimension.

41. The processing line of claim 40, wherein the data processing unit is further adapted to compare the generated reflection profile to a library of reference reflection profiles, each reference reflection profile having an associated column dimension metric, select a reference reflection profile closest to the generated reflection profile, and determine the dimension of the columns based on the column dimension metric associated with the selected reference reflection profile.

42. The processing line of claim 40, wherein the detector is further adapted to generate the reflection profile based on at least one of intensity and phase of the reflected light.

43. The processing line of claim 40, wherein the metrology tool comprises at least one of a scatterometer, an ellipsometer, and a reflectometer.

44. The processing line of claim 40, wherein the data processing unit is further adapted to compare the generated reflection profile to a target reflection profile and determine the dimension of the columns based on the comparison of the generated reflection profile and the target reflection profile.

45. The processing line of claim 40, wherein the processing tool further comprises an etch tool, and the controller is further adapted to determine at least one of an etch time parameter, a plasma chemical composition parameter, an RF power parameter, a gas flow parameter, a chamber temperature parameter, a chamber pressure parameter, and an end-point signal parameter.

46. The processing line of claim 40, wherein the processing tool further comprises a photolithography tool, and the controller is further adapted to determine at least one of an exposure time parameter, an exposure dose parameter, a depth of focus parameter, a resist spin speed parameter, a soft bake temperature parameter, a post exposure bake temperature parameter, a cool plate temperature parameter, a developer temperature parameter, and a focus tilt parameter.

47. The processing line of claim 40, wherein the columns in one trench are aligned with the columns in an adjacent trench.

48. The processing line of claim 40, wherein the columns in one trench are offset with respect to the columns in an adjacent trench.

49. The processing line of claim 40, wherein the controller is further adapted to identify a fault condition associated with the columns based on the determined column dimension.

50. A metrology tool adapted to receive a wafer having a test structure comprising a plurality of trenches each having a width dimension, and a plurality of columns defined in the trenches, comprising:

a light source adapted to illuminate at least a portion of the columns, each column having a width dimension less than the width dimension of the trench in which it is defined;

a detector adapted to measure light reflected from the illuminated portion of the columns to generate a reflection profile; and

a data processing unit adapted to compare the generated reflection profile to a library of reference reflection profiles, each reference reflection profile having an associated column dimension metric, select a reference reflection profile closest to the generated reflection profile, and determine a dimension of the columns based on the column dimension metric associated with the selected reference reflection profile.

51. A metrology tool adapted to receive a wafer having a test structure comprising a plurality of trenches each having a width dimension and a plurality of columns defined in the trenches, comprising:

a light source adapted to illuminate at least a portion of the columns, each column having a width dimension less than the width dimension of the trench in which it is defined;

a detector adapted to measure light reflected from the illuminated portion of the columns to generate a reflection profile; and

a data processing unit adapted to compare the generated reflection profile to a target reflection profile and determine a dimension of the columns based on the comparison of the generated reflection profile and the target refection profile.

52. A test structure, comprising:

a plurality of trenches each having a width dimension; and

a plurality of columns defined in the trenches each having a width dimension less than the width dimension of the trench in which is defined.

53. The test structure of claim 52, further comprising a base layer, the trenches being defined in the base layer.

54. The test structure of claim 52, wherein the columns in one trench are aligned with the columns in an adjacent trench.

55. The test structure of claim 52, wherein the columns in one trench are offset with respect to the columns in an adjacent trench.

56. The test structure of claim 53, wherein the base layer comprises at least one of a photoresist layer, a substrate layer, an insulative layer, and a conductive layer.

57. A metrology tool, comprising:

means for receiving a wafer having a test structure comprising a plurality of trenches each having a width dimension, and a plurality of columns defined in the trenches, each column having a width dimension less than the width dimension of the trench in which it is defined;

means for illuminating at least a portion of the columns with a light source;

means for measuring light reflected from the illuminated portion of the columns to generate a reflection profile; and

means for determining a dimension of the columns based on the reflection profile.

58. The metrology tool of claim 57, further comprising:

means for comparing the generated reflection profile to a library of reference reflection profiles, each reference reflection profile having an associated column dimension metric;

means for selecting a reference reflection profile closest to the generated reflection profile; and

means for determining the dimension of the columns based on the column dimension metric associated with the selected reference reflection profile.

59. The metrology tool of claim 57, further comprising:

means for comparing the generated reflection profile to a target reflection profile; and

means for determining the dimension of the columns based on the comparison of the generated reflection profile and the target reflection profile.