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Substrate processing apparatus and substrate processing method

  • US 6,656,281 B1
  • Filed: 06/08/2000
  • Issued: 12/02/2003
  • Est. Priority Date: 06/09/1999
  • Status: Expired due to Fees
First Claim
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1. A substrate processing apparatus, comprising:

  • a processing chamber in which a substrate is developed by a developing solution applied over the substrate;

    a filter configured to filter air to be sent into the processing chamber;

    a blast unit configured to send the filtered air into said processing chamber from the top toward the bottom thereof;

    an exhaust unit configured to exhaust gas from within said processing chamber through the bottom thereof; and

    a control unit configured to regulate at least one of a blast amount of said blast unit and an exhaust amount of said exhaust unit concomitantly with a change in pressure in said processing chamber to maintain the pressure in said processing chamber nearly constant.

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