Post etch inspection system

• US 6,656,374 B2
• Filed: 04/02/2001
• Issued: 12/02/2003
• Est. Priority Date: 04/02/2000
• Status: Expired due to Fees

• Current Assignee: Orbotech Limited (KLA Corporation)
• Original Assignee: Orbotech Limited (KLA Corporation)
• Inventors: Savareigo, Nissim
• Primary Examiner(s): ALANKO, ANITA KAREN
• Application Number:
  US09/824,500
• Publication Number:
  US 20010035267A1
• Time in Patent Office: 974 Days
• Field of Search: 216/60, 216/85, 438/8, 438/9
• US Class Current: 216/60
• CPC Class Codes: G01N 21/95684 Patterns showing highly reflecting parts, e.g. metallic elements

Abstract

Apparatus and method for post etching inspection of electrical circuits including an optical inspection assembly viewing an electrical circuit at various regions thereon and providing output indications of etching characteristics of the electrical circuit at the various regions and output circuitry receiving the output indications of etching characteristics of the electrical circuit at the various regions and providing an output indication of variations in the etching characteristics between at least some of the various regions.

Claims

1. A method for post etching inspection of electrical circuits, comprising:

viewing an electrical circuit at various locations thereon and providing output indications of a width of a conductor line on said electrical circuit at said various locations along a length of the conductor line; and

receiving said output indications of said width of a conductor line on said electrical circuit at said various locations and providing an output indication of variations in an etching characteristic between at least some of said various locations, said etching characteristic corresponding to a line width of the conductor line being generally uniform at least over a minimum length of the conductor line.

2. A method according to claim 1 and wherein said providing an output indication of a width of a conductor line comprises:

receiving an output from an inspection assembly and identifying portions of a conductor line having a uniform width over at least a minimum length.

3. A method according to claim 2 and wherein said providing an output indication of a width of a conductor line also comprises:

indication point generating, which defines at least one point location which represents at least one selected from the group consisting of;

the location and length of a line segment having a uniform width over at least a selected minimum length.

4. A method according to claim 1 and wherein said providing an output indication of a width of a conductor line comprises:

indication point generating, which defines at least one point location which represents at least one selected from the group consisting of;

the location and length of a line segment having a uniform width over at least a selected minimum length.

5. A method according to claim 3 and wherein said providing an output indication of a width of a conductor line also comprises:

measuring line width of each line segment having a uniform width over at least a selected minimum length.

6. A method according to claim 2 and wherein said providing an output indication of a width of a conductor line also comprises:

measuring a line width of each line segment having a uniform width over at least a selected minimum length.

7. A method according to claim 1 and wherein said providing an output indication of a width of a conductor line comprises:

measuring a line width of each line segment having a uniform width over at least a selected minimum length.

8. A method according to claim 3 and wherein said providing an output indication of variations in an etching characteristic also comprises:

generating a report which indicates a line width of each line segment having a uniform width over at least a selected minimum length in a graphical manner.

9. A method according to claim 2 and wherein said providing an output indication of variations in an etching characteristic also comprises:

generating a report which indicates a line width of each line segment having a uniform width over at least a selected minimum length in a graphical manner.

10. A method according to claim 1 and wherein said providing an output indication of variations in an etching characteristic comprises:

generating a report which indicates a line width of each line segment having a uniform width over at least a selected minimum length in a graphical manner.

11. A method according to claim 1 and wherein said providing an output indication of variations in an etching characteristic comprises:

generating a report which indicates a statistical distribution of a line width of respective line segments each having a uniform width over at least a selected minimum length in a graphical manner.

12. A method according to claim 11 and wherein said statistical distribution has sub-pixel accuracy.

13. A method according to claim 2 and wherein said providing an output indication of variations in an etching characteristic comprises:

generating a report which indicates a statistical distribution of a line width of line segments each having a uniform width over at least a selected minimum length in a graphical manner.

14. A method according to claim 13 and wherein said statistical distribution has sub-pixel accuracy.

15. A method according to claim 3 and wherein said providing an output indication of variations in an etching characteristic comprises:

generating a report which indicates a statistical distribution of a line width of respective line segments each having a uniform width over at least a selected minimum length in a graphical manner.

16. A method according to claim 15 and wherein said statistical distribution has sub-pixel accuracy.

17. A method according to claim 4 and wherein said providing an output indication of variations in an etching characteristic comprises:

generating a report which indicates a statistical distribution of the line widths of line segments each having a uniform width over at least a selected minimum length in a graphical manner.

18. A method according to claim 17 and wherein said statistical distribution has sub-pixel accuracy.

19. A method according to claim 10 and wherein said providing an output indication of variations in an etching characteristic comprises:

generating a report which indicates a statistical distribution of the a line width of line segments each having a uniform width over at least a selected minimum length in a graphical manner.