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Thin film forming method and apparatus

  • US 6,656,518 B2
  • Filed: 09/30/2002
  • Issued: 12/02/2003
  • Est. Priority Date: 10/14/1999
  • Status: Expired due to Term
First Claim
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1. A thin film forming method, comprising steps of:

  • forming a thin film of a substance on an object by deposition by vaporizing the substance;

    measuring of a thickness of the thin film deposited on the object during deposition using an optical film thickness meter to measure light quantity values of transmission or reflection, wherein the optical film thickness meter measures the thickness of a thin film using the light quantity value of transmission or reflection when a prescribed light is applied to the object on which the thin film is formed, and wherein the light quantity value depends on the thickness of the thin film; and

    ;

    controlling the vaporizing with a controller using the signals from said optical film thickness meter, by comparing actual light quantity value variation versus time with stored standard light quantity value variations over time measured when a film is formed on a standard object.

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