Apparatus for optically characterising thin layered material
First Claim
1. An apparatus for characterising a thin-layer material by backscattering Raman spectrometry comprising a frame, a monochromatic excitation laser source (21), optical means (23, 24) directing a light flux that is emitted by the excitation source (21) toward the material to be characterised, and means for collecting (24) and selecting (27, 28) the light diffused by Raman effect, whereas the said apparatus is such that in the optical means directing the excitation laser flux toward the material, there exists between the laser and the material a means (22) homogenising the distribution of energy per surface unit, over a minimum surface of some tens of square micrometers, characterised in that the said apparatus comprises means for reflectometric measurement (3-14), integral with the collecting and selecting means, whereas this reflectometric measuring means comprises reflectometric excitation means (3-9) directed on the same zone of the material as the Raman excitation means.
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Abstract
The invention concerns an apparatus for optically characterising a thin-layer material by backscattering Raman spectometry comprising a frame, a monochromatic excitation laser source (21), optical means (23, 24) directing a light flux emitted by the source towards the material to be characterised, provided with means (22) homogenising the distribution of energy per surface unit, over a minimum surface of some tens of square micrometers, and means for collecting (24) and selecting (27, 28) the light diffused by Raman effect. The apparatus further comprises reflectometric measuring means (3-14) integral with the Raman measuring means, including reflectometric excitation means (3-9) directed on the same sample zone as the Raman excitation means.
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13 Claims
- 1. An apparatus for characterising a thin-layer material by backscattering Raman spectrometry comprising a frame, a monochromatic excitation laser source (21), optical means (23, 24) directing a light flux that is emitted by the excitation source (21) toward the material to be characterised, and means for collecting (24) and selecting (27, 28) the light diffused by Raman effect, whereas the said apparatus is such that in the optical means directing the excitation laser flux toward the material, there exists between the laser and the material a means (22) homogenising the distribution of energy per surface unit, over a minimum surface of some tens of square micrometers, characterised in that the said apparatus comprises means for reflectometric measurement (3-14), integral with the collecting and selecting means, whereas this reflectometric measuring means comprises reflectometric excitation means (3-9) directed on the same zone of the material as the Raman excitation means.
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