×

Apparatus and method for reactive atom plasma processing for material deposition

  • US 6,660,177 B2
  • Filed: 11/07/2001
  • Issued: 12/09/2003
  • Est. Priority Date: 11/07/2001
  • Status: Expired due to Term
First Claim
Patent Images

1. A method for shaping a surface of a workpiece, comprising:

  • placing the workpiece in a plasma processing chamber including a plasma torch;

    translating at least one of the workpiece and the plasma torch; and

    using reactive atom plasma processing to add material to the surface of the workpiece and shape the surface with the discharge from the plasma torch.

View all claims
  • 6 Assignments
Timeline View
Assignment View
    ×
    ×