Reduced surface charging in silicon-based devices

• US 6,660,552 B2
• Filed: 03/14/2002
• Issued: 12/09/2003
• Est. Priority Date: 01/19/2001
• Status: Active Grant

• Current Assignee: Silicon Light Machines Corporation (SCREEN Holdings Co., Ltd.)
• Original Assignee: Silicon Light Machines Corporation (SCREEN Holdings Co., Ltd.)
• Inventors: Hunter, James, Bruner, Michael, Carroll, Clinton, Payne, Alexander, Gudeman, Christopher
• Primary Examiner(s): Niebling, John F.
• Assistant Examiner(s): Roman, Angel
• Application Number:
  US10/100,627
• Publication Number:
  US 20020098610A1
• Time in Patent Office: 635 Days
• Field of Search: 438/48, 438/57, 438/58, 438/64, 438/116
• US Class Current: 438/48
• CPC Class Codes: B81B 7/0012 Protection against reverse engineering, unauthorised use, use in unintended manner, wrong insertion or pin assignment
• CPC Class Codes: G02B 26/0808 by means of one or more diffracting elements

Abstract

A grating light valve with reduced surface charging is disclosed. Surface charging is measured by the propensity an insulating surface to accept and transport a charge. The grating light valve of the instant invention has a plurality of spaced and movable ribbons formed from Si₃N₄ coupled to a substrate structure formed of SiO₂. A portion of the ribbons are moved to alternate between conditions for constructive and destructive interference with an incident light source having a wavelength λ by applying the appropriate switching voltages across the portion of ribbons and the substrate structure. When charging occurs on surfaces of the grating light valve, the switching voltages required to operate the grating light valve are shifted and diminishing the performance of the grating light valve. By drying silicon-based surfaces of the grating light valve and exposing the silicon-based surfaces of the grating light valve to a Nitrogen-rich pacify gas environment, the surfaces of the grating light valve exhibit reduced charging and consistent response to applied bias voltages. In the drying step, residual water or moisture is removed from the surfaces by elevating the temperature of the grating light valve structure in a vacuum environment. Preferably, the drying is carried at temperatures of 250 degrees Celsius or greater and at vacuum pressures of 10⁻⁶ Torr or less. After the surface of the grating light valve are dried, the surfaces are exposed to the Nitrogen-rich pacifying gas environment at ambient temperature. Presumably, the Nitrogen-rich pacify gas environment blankets the silicon-based surfaces of the grating light valve with adsorbed, physisorbed, or chemi-adsorbed Nitrogen and thus reduces the propensity of those surfaces to accept water or moisture, which is believed to facilitate the charging. After the surfaces of the grating light valve are treated according to the current invention, charging of the surface remains low and stable even for several days in open air conditions.

Claims

1. A method of treating silicon-based surfaces of a micro-device structure comprising a plurality of movable surfaces, the method comprising:

a. heating the micro-device structure in a vacuum environment by maintaining a temperature sufficient to remove residual water or moisture from the surfaces; and

b. exposing the micro-device structure to a pacifying gas environment after maintaining the temperature.

2. The method of claim 1, whereby exposing the micro-device structure to the pacifying gas environment reduces charging of the surfaces.

3. The method of claim 1, comprising maintaining the temperature of the micro-device structure at 250 Celsius or higher while the micro-device structure is in the vacuum environment.

4. The method of claim 1, comprising maintaining the temperature of the micro-device structure at 250 Celsius or higher while exposing the micro-device structure to the pacifying gas environment.

5. The method of claim 3, wherein the pacifying gas environment is a Nitrogen-rich pacifying gas environment.

6. The method of claim 5, wherein the Nitrogen-rich pacifying gas environment is adjusted to pressure between 0.5 Torr and 6 Torr.

7. The method of claim 1, wherein the pacifying gas environment has a water content of less than 1 part-per-million (ppm).

8. The method of claim 5, wherein heating the micro-device structure in a vacuum environment, maintaining the temperature of the micro-device structure at 250 Celsius or higher while the micro-device structure in the vacuum environment and exposing the micro-device to a Nitrogen rich pacifying gas environment are performed within an isolation chamber.

9. The method of claim 5, further comprising sealing the micro-device structure in a die.

10. The method of claim 1, wherein the pacifying gas environment comprises a noble gas selected from the group consisting of He, Ar, Kr, and Rn.

34. The method of claim 1, further comprising cooling the micro-device structure to an ambient temperature in a range of 20 to 30 degrees Celsius prior to the step of exposing.

11. A method of making a MEM device comprising the steps of:

a. removing moisture from one or more surfaces of a MEM structure by heating the one or more surfaces under a vacuum at a temperature sufficient to remove water or moisture from the one or more surfaces, wherein the heating comprises maintaining the temperature for a period of time; and

b. exposing the one or more surfaces to a pacifying gas after maintaining the temperature for the period of time.

12. The method of claim 11, comprising sealing the one or more surfaces within or on a die structure.

13. The method of claim 11, whereby the method reduces charging of the one or more surfaces.

14. The method of claim 11, wherein the temperature is 250 Celsius or higher.

15. The method of claim 11, comprising maintaining the temperature of the one or more surfaces at 250 Celsius or higher while exposing the one or more surfaces to the pacifying gas.

16. The method of claim 11, wherein the pacifying gas is a Nitrogen-rich pacifying gas.

17. The method of claim 12, wherein exposing the one or more surfaces to a pacifying gas is performed in an isolation chamber.

18. The method of claim 17, wherein the exposing is performed prior to sealing the one or more surfaces within or on the die structure.

19. The method of claim 16, wherein the Nitrogen-rich pacifying gas environment is adjusted to a pressure between 0.5 Torr and 6 Torr.

20. The method of claim 19, wherein a partial pressure of Nitrogen of the Nitrogen-rich pacifying gas environment is in a range of from 0.5 to 3.0 Torr.

21. The method of claim 11, wherein the pacifying gas environment comprises an inert gas selected from the group consisting of N₂, He, Ar, Xe and Rn.

22. The method of claim 11, wherein the vacuum environment is adjusted to a pressure of 10⁻

6 Torr or less.

23. The method of claim 14, further comprising cooling the MEMS structure to ambient temperature in a range 20 to 30 degrees Celsius before exposing the one or more surfaces to a pacifying gas.

24. The method of claim 11, wherein the MEM structure comprises a plurality of spatially arranged ribbons formed from Si₃N₄ and a substrate structure comprising silicon, wherein the ribbons are configured to switched between the conditions for constrictive and destructive interference with an incident light source λ

by applying a bias voltage across a portion of the movable ribbons and the substrate structure.

25. The method of claim 11, further comprising cooling the MEM structure to ambient temperature in a range of 20 to 30 degrees Celsius prior to the step of exposing the micro-device structure to the pacifying gas environment.

26. The method of claim 11, wherein the temperature is 300 Celsius or higher.

27. The method of claim 12, wherein sealing the MEM structure on or within the die structure comprises forming a glass cap over the die structure such that the micro-device structure is on or within the die.

28. A method of making a micro-device comprising:

a. removing moisture from surfaces of a MEM structure and a die structure by heating at a temperature of 250 Celsius or higher in a vacuum, wherein the heating comprises maintaining the temperature for a period of time;

b. exposing the MEM structure and the die structure to a pacifying gas environment after the heating; and

c. sealing the die such that the MEM structure is positioned within the die structure.

29. The method of claim 28, wherein the steps of exposing and sealing are performed in an isolation chamber.

30. The method of claim 28, wherein the step of sealing comprises soldering a glass cap to the die with the MEM structure therebetween.

31. The method of claim 28, wherein pacifying gas environment comprises an inert gas selected from a group consisting of He, Ar, Kr, Xe and Rn.

32. The method of claim 28, wherein the vacuum environment is adjusted to a pressure below 10⁻

6 Torr.

33. The method of claim 28, further comprising cooling the MEM structure and the die structure to an ambient temperature in a range of 20 to 30 degrees Celsius prior to the step of exposing.