Method and system for treating skin
DCFirst Claim
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1. A method for carrying out a treatment of skin, comprising, for each of one or more regions of the skin:
- (a) deforming the skin so that the region of skin protrudes from surrounding skin;
(b) applying radio frequency (RF) energy to the skin; and
(c) massaging the skin.
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Abstract
A method and system for treating skin. The method comprises deforming the skin so that a region of skin protrudes from surrounding skin, and applying radio frequency (RF) energy to the skin. The system comprises a skin deformer that deforms a region of skin so that a region of skin protrudes out from surrounding skin. The system also comprises one or more RF elemodes configured to apply RF energy to the skin. The invention may be used to treat subcutaneous adipose tissue and cartage.
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Citations
18 Claims
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1. A method for carrying out a treatment of skin, comprising, for each of one or more regions of the skin:
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(a) deforming the skin so that the region of skin protrudes from surrounding skin;
(b) applying radio frequency (RF) energy to the skin; and
(c) massaging the skin. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A system for treating skin, comprising:
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(a) a skin deformer deforming the skin so that a region of skin protrudes out from surrounding skin;
(b) one or more RF electrodes configured to apply RF energy to the skins;
(c) a massage for massaging the skin. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
(a) an applicator configured to be applied to the skin having a housing incompletely enclosing a space such that when applied to the skin the space is completely enclosed;
(b) a pump removing air from the space when the applicator is applied to the skin.
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11. The system according to claim 8 further comprising a cooler for cooling the skin.
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12. The system according to claim 8 further comprising an impedance meter for measuring an impedance across one or more RF electrode pairs.
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13. The system according to claim 8 further comprising a processor configured to determine a heat distribution in the skin based upon one or more impedance measurements.
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14. The system according to claim 13 wherein the processor is further configured to determine one or more parameters of the RF energy based upon one or more impedance measurements.
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15. The system according to claim 14 wherein the one or more parameters are selected from the group comprising a pulse duration of the RF energy, a frequency of the RF energy, a power of the RF energy, and a delay time between cooling the skin an and-application of the RF energy.
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16. The system according to claim 8 wherein the frequency of the RF energy is from 0.3 to 10 MHz.
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17. The system according to claim 8 wherein the power of the RF energy is from 1 to 300 W.
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18. The system according to claim 9 wherein the negative pressure is from 0.2 to 1 atmosphere.
Specification