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Method and apparatus for forming deposited film

  • US 6,667,240 B2
  • Filed: 03/08/2001
  • Issued: 12/23/2003
  • Est. Priority Date: 03/09/2000
  • Status: Expired due to Fees
First Claim
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1. A method for forming a deposited film, comprising generating plasma in a plurality of successive vacuum containers and continuously forming a deposited film on a belt-like substrate while continuously moving the substrate in a longitudinal direction of the substrate,wherein the film is formed while an opening of a discharge container is adjusted by using an opening adjusting plate having a shape which is set so as to reduce ununiformity of a deposited film thickness in a width direction of the substrate on basis of a measurement of a deposition rate distribution by shielding the belt-like substrate from a plasma discharge region to limit a deposition region on the belt-like substrate.

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