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Method of reducing process plasma damage using optical spectroscopy

  • US 6,673,200 B1
  • Filed: 07/12/2002
  • Issued: 01/06/2004
  • Est. Priority Date: 05/30/2002
  • Status: Expired due to Term
First Claim
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1. A method for determining process species associated with plasma charging damage, the method comprising:

  • measuring a first optical emission spectrum from a plasma directed to a test wafer during a plasma process operation;

    measuring a plasma induced charge level on the test wafer;

    correlating the optical emission spectrum with the plasma induced charge level; and

    from the correlation, identifying a molecular species contributing to the plasma induced charge level.

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