Growth of compound semiconductor structures on patterned oxide films and process for fabricating same
First Claim
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1. A process for fabricating a semiconductor device structure comprising:
- providing a monocrystalline semiconductor substrate;
epitaxially growing a monocrystalline oxide layer overlying the substrate, the oxide layer having a predetermined thickness and comprising a material selected from the group consisting of lanthanum aluminate, alkaline earth metal titanates, alkaline earth metal zirconates, alkaline earth metal hafnates, alkaline earth metal tantalates, alkaline earth metal ruthenates, and alkaline earth metal niobates;
growing an amorphous layer underlying the monocrystalline oxide layer by increasing the partial pressure of oxygen during the step of epitaxially growing a monocrystalline oxide layer to a partial pressure greater than that needed to grow the monocrystalline oxide layer;
photolithographically patterning and etching the monocrystalline oxide layer to form a plurality of oxide mesas; and
epitaxially growing a monocrystalline semiconductor layer overlying each of the oxide mesas.
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Abstract
Compound semiconductor structures and devices can be grown on patterned oxide layers deposited on silicon. The deposition of Group II-VI and Group II-V compound semiconductors on patterned wafers results in an increase in the critical thickness for lattice mismatched layers and the relief of strain energy through side walls. As a result, high crystalline quality compound semiconductor material can be grown on less expensive and more accessible substrate to more cost effectively produce semiconductor components and devices having enhanced reliability.
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Citations
18 Claims
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1. A process for fabricating a semiconductor device structure comprising:
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providing a monocrystalline semiconductor substrate;
epitaxially growing a monocrystalline oxide layer overlying the substrate, the oxide layer having a predetermined thickness and comprising a material selected from the group consisting of lanthanum aluminate, alkaline earth metal titanates, alkaline earth metal zirconates, alkaline earth metal hafnates, alkaline earth metal tantalates, alkaline earth metal ruthenates, and alkaline earth metal niobates;
growing an amorphous layer underlying the monocrystalline oxide layer by increasing the partial pressure of oxygen during the step of epitaxially growing a monocrystalline oxide layer to a partial pressure greater than that needed to grow the monocrystalline oxide layer;
photolithographically patterning and etching the monocrystalline oxide layer to form a plurality of oxide mesas; and
epitaxially growing a monocrystalline semiconductor layer overlying each of the oxide mesas. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A process for fabricating a compound semiconductor device structure comprising the steps of:
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providing a monocrystalline substrate comprising silicon;
epitaxially growing a first monocrystalline layer comprising (Ba,Sr)TiO3 overlying the monocrystalline substrate;
during the step of epitaxially growing a first monocrystalline layer, forming an amorphous layer comprising silicon oxide underlying the first monocrystalline layer;
photolithographically patterning and etching the first monocrystalline layer to form a plurality of spaced apart oxide islands;
epitaxially growing a second monocrystalline layer comprising a compound semiconductor material overlying each of the oxide islands;
forming an integrated circuit at least partially in the substrate;
forming a plurality of semiconductor devices at least partially in the second monocrystalline layer, one overlying each of the oxide islands; and
electrically coupling the integrated circuit and each of the plurality of semiconductor devices. - View Dependent Claims (16, 17, 18)
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Specification