Projection exposure methods and apparatus, and projection optical systems
First Claim
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1. A dioptric projection optical system for forming an image of a pattern on a first surface, onto a second surface by action of radiation-transmitting refractors, comprising:
- a front lens unit having a positive refracting power, located in an optical path between said first surface and said second surface;
a rear lens unit having a positive refracting power, located in an optical path between said front lens unit and said second surface; and
an aperture stop located in the vicinity of a rear focal point position of said front lens unit;
said projection optical system being telecentric on the said first surface side and on the said second surface side, wherein the following condition is satisfied;
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Abstract
A dioptric projection optical system for imaging a reduced image of a pattern on a first surface onto a second surface using radiation-transmitting refractors. The projection optical system has a front lens unit of a positive refracting power and a rear lens unit of a positive refracting power. An aperture stop is located in the vicinity of a rear focal point of the front lens unit.
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20 Claims
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1. A dioptric projection optical system for forming an image of a pattern on a first surface, onto a second surface by action of radiation-transmitting refractors, comprising:
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a front lens unit having a positive refracting power, located in an optical path between said first surface and said second surface;
a rear lens unit having a positive refracting power, located in an optical path between said front lens unit and said second surface; and
an aperture stop located in the vicinity of a rear focal point position of said front lens unit;
said projection optical system being telecentric on the said first surface side and on the said second surface side, wherein the following condition is satisfied;
- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 16, 17, 18, 19, 20)
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15. A method of fabricating a dioptric projection optical system for forming an image of a pattern on a first surface, onto a second surface by action of radiation-transmitting refractors, comprising:
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a step of locating a front lens unit having a positive refracting power;
a step of locating a rear lens unit having a positive refracting power, between the front lens unit and said second surface; and
a step of locating an aperture stop between said front lens unit and said rear lens unit;
wherein said front lens unit, said rear lens unit, and said aperture stop are located so that the projection optical system is telecentric on the said first surface side and on the said second surface side, and said method using the projection optical system satisfying the following condition;
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Specification