Anodizing system with a coating thickness monitor and an anodized product

• US 6,674,533 B2
• Filed: 12/21/2000
• Issued: 01/06/2004
• Est. Priority Date: 12/21/2000
• Status: Expired due to Term

• Current Assignee: Sensory Analytics, LLC
• Original Assignee: Joseph K. Price
• Inventors: Price, Joseph K.
• Primary Examiner(s): TURNER, ARCHENE A
• Application Number:
  US09/742,595
• Publication Number:
  US 20020112967A1
• Time in Patent Office: 1,111 Days
• Field of Search: 356/355, 356/357, 356/381, 356/382, 356/485, 356/477, 356/482, 356/496, 356/503
• US Class Current: 356/503
• CPC Class Codes: C25D 11/005 Apparatus specially adapted for electrolytic conversion coating apparatus in general for electrolytic coating C25D17/00
• CPC Class Codes: C25D 11/04 of aluminium or alloys based thereon
• CPC Class Codes: C25D 21/12 Process control or regulation controlling or regulating in general G05

Abstract

An anodizing system for forming a anodized coating on at least a portion of a substrate thereby creating an anodized substrate is disclosed. The anodizing system includes a bath, a coating thickness monitor, at least one probe and at least one controller. The coating thickness monitor includes at least one radiation source directed at at least a portion of the anodized substrate; at least one probe for capturing at least a portion of the radiation reflected and refracted by the anodized coating on the anodized substrate, the captured radiation being at least a portion of the radiation directed the anodized substrate from the radiation source; and at least one detector in communication with the at least one probe, the at least one detector capable of processing the captured radiation to allow a determination of at least the thickness.

Claims

1. An anodizing system for forming a anodized coating on at least a portion of a substrate thereby creating an anodized substrate, said anodizing system including:

(a) a bath into which the substrate is placed to facilitate the formation of the anodized coating on at least a portion of on the substrate thereby creating the anodized substrate; and

(b) a coating thickness monitor for measuring the thickness of at least a portion of the anodized coating on the substrate formed in said bath, said coating thickness monitor including;

(i) at least one radiation source for providing radiation to be directed at least a portion of the anodized substrate,

(ii) at least one probe for directing said radiation at said at least a portion of the anodized substrate and for capturing at least a portion of the radiation reflected and refracted by the anodized coating on the anodized substrate, the captured radiation being at least a portion of the radiation directed the anodized substrate from said radiation source,

(iii) at least one detector in communication with said at least one probe, said at least one detector capable of processing the captured radiation to allow a determination of at least the thickness of the anodized coating on the substrate; and

.

(iv) an optical guide system capable of transmitting said provided radiation to said at least one probe and said captured radiation from said at least one probe to said at least one detector.

2. The anodizing system according to claim 1 wherein said optical guide is an optical fiber.

3. The anodizing system according to claim 2 wherein said optical fiber is a plurality of optical fibers.

4. The anodizing system according to claim 1 further including an additional guide system capable of transmitting at least a portion of the radiation from said at least one radiation source to direct the at least a portion of the radiation at at least a portion of the anodized substrate.

5. The anodizing system according to claim 4 wherein said additional guide system is an additional optical guide.

6. The anodizing system according to claim 5 wherein said additional optical guide is an optical fiber.

7. The anodizing system according to claim 6 wherein said additional optical fiber is a plurality of optical fibers.

8. The anodizing system according to claim 4 further including a supplementary guide system capable of at least one of:

(1) transmitting additional captured radiation from said at least one probe to said at least one detector;

(2) transmitting at least a portion of the radiation from at least one additional radiation source to direct at least a portion of the additional radiation at at least a portion of the anodized substrate; and

(3) transmitting at least a portion of the additional radiation from at least one additional radiation source to direct the at least a portion of the additional radiation at at least a portion of the anodized substrate and transmitting the additional captured radiation from said at least one probe to said at least one detector, the additional captured radiation being at least a portion of the additional radiation directed at the anodized substrate from said at least one additional radiation source.

9. The anodizing system according to claim 6 wherein said supplementary guide is an additional optical guide.

10. The anodizing system according to claim 9 wherein the said optical guide is an optical fiber.

11. The anodizing system according to claim 9 wherein the said optical fiber is a plurality of optical fibers.

12. The anodizing system according to claim 8 wherein said guide system and said supplementary guide system are selected to be capable of transmitting a broad spectral range of captured radiation from said at least one probe to said at least one detector.

13. The anodizing system according to claim 1 wherein said at least one radiation source is polychromatic.

14. The anodizing system according to claim 13 wherein the polychromatic radiation includes at least one of ultraviolet radiation, visible radiation, and infrared radiation.

15. The anodizing system according to claim 1 wherein said at least one source radiation is monochromatic.

16. The anodizing system according to claim 1 further including an additional radiation source.

17. The anodizing system according to claim 16 wherein said additional radiation is polycbromatic.

18. The anodizing system according to claim 16 wherein said additional polychromatic radiation is at least one of ultraviolet radiation, visible radiation, and infrared radiation.

19. The anodizing system according to claim 16 wherein said additional radiation is monochromatic.

20. The anodizing system according to claim 16 wherein a spectral range of said at least one radiation source and a spectral range of said additional radiation source partially overlap.

21. The anodizing system according to claim 20 wherein said partial overlap increases at least one of a signal to noise ratio for the captured radiation and a total spectral range of captures radiation.

22. The anodizing system according to claim 16 wherein one of said at least one radiation source and said additional radiation source is visible radiation and the other of said at least radiation source and said additional radiation source is infrared radiation.

23. The anodizing system according to claim 1 said at least one probe further includes a collimator.

24. The anodizing system according to claim 23 wherein said collimator facilities a depth of field of a sufficient value to measure the anodized coating thickness.

25. The anodizing system according system according to claim 1 wherein said at least one probe is external to said bath.

26. The anodizing system according to claim 1 wherein said at least one probe is within said bath.

27. The anodizing system according to claim 1 wherein said at least one detector includes an interferometer.

28. The anodizing system according to claim 1 wherein said processing of the captured radiation to determine the coating thickness by said coating thickness monitor includes using at least one of:

a color, an interference pattern, using an amount of absorbed radiation, an intensities ratio of a minimum reflected radiation wavelength and a maximum reflected radiation wavelength, and a Fast Fourier Transformation (FFT) of the captured radiation.

29. The anodizing system according to claim 1 wherein said processing of the captured radiation to determine the coating thickness by said coating thickness monitor includes using a Fast Fourier Transformation (FFT) of the captured radiation.

30. The anodizing system for forming a anodized coating on at least a portion of a substrate thereby creating an anodized substrate, said anodizing system including:

(a) a bath into which the substrate is placed to facilitate the formation of the anodized coating on at least a portion of on the substrate thereby creating the anodized substrate;

(b) a coating thickness monitor for measuring the thickness of at least a portion of the anodized coating on the substrate formed in said bath, said coating thickness monitor including;

(i) at least one radiation source for providing radiation to be directed at at least a portion of the anodized substrate;

(ii) at least one probe for directing said radiation at said at least a portion of the anodized substrate and for capturing at least a portion of the radiation reflected and refracted by the anodized coating on the anodized substrate, the captured radiation being at least a portion of the radiation directed the anodized substrate from said radiation source;

(iii) at least one detector in communication with said at least one probe, said at least one detector capable of processing the captured radiation to allow a determination of at least the thickness of the anodized coating on the substrate;

(iv) at least one optical guide system capable of transmitting said provided radiation to said at least one probe and said captured radiation from said at least one probe to said at least one detector; and

(c) at least one controller in communication with said coating thickness monitor and said bath.

31. The anodizing system according to claim 30 wherein said at least one controller regulates a relative movement of said probe and the anodized substrate.

32. The anodizing system according to claim 30 wherein said at least one controller regulates at least one process parameter of said bath.

33. The anodizing system according to claim 31 wherein said at least one process parameter includes at least one of bath chemistry, bath temperature, anodizing voltage, anodizing current and anodizing time.

34. The anodizing system according to claim 30 wherein said at least one controller regulates a process endpoint.

35. The anodizing system according to claim 30 wherein said optical guide is an optical fiber.

36. The anodizing system according to claim 35 wherein said optical fiber is a plurality of optical fibers.

37. The anodizing system according to claim 30 further including an additional guide system capable of transmitting at least a portion of the radiation from said at least one radiation source to direct the at least a portion of the radiation at at least a portion of the anodized substrate.

38. The anodizing system according to claim 37 wherein said additional guide system is an additional optical guide.

39. The anodizing system according to claim 38 wherein said additional optical guide is an optical fiber.

40. The anodizing system according to claim 39 wherein said additional optical fiber is a plurality of optical fibers.

41. The anodizing system according to claim 37 further including a supplementary guide system capable of at least one of:

(1) transmitting additional captured radiation from said at least one probe to said at least one detector;

(2) transmitting at least a portion of the radiation from at least one additional radiation source to direct at least a portion of the additional radiation at at least a portion of the anodized substrate; and

(3) transmitting at least a portion of the additional radiation from at least one additional radiation source to direct the at least a portion of the additional radiation at at least a portion of the anodized substrate and transmitting the additional captured radiation from said at least one probe to said at least one detector, the additional captured radiation being at least a portion of the additional radiation directed at the anodized substrate from said at least one additional radiation source.

42. The anodizing system according to claim 40 wherein said supplementary guide is an additional optical guide.

43. The anodizing system according to claim 42 wherein the said optical guide is an optical fiber.

44. The anodizing system according to claim 42 wherein the said optical fiber is a plurality of optical fibers.

45. The anodizing system according to claim 41 wherein said guide system and said supplementary guide system are selected to be capable of transmitting a broad spectral range of captured radiation from said at least one probe to said at least one detector.

46. The anodizing system according to claim 30 wherein said at least one radiation source is polychromatic.

47. The anodizing system according to claim 46 wherein the polychromatic radiation includes at least one of ultraviolet radiation, visible radiation, and infrared radiation.

48. The anodizing system according to claim 30 wherein said at least one source radiation is monochromatic.

49. The anodizing system according to claim 30 further including an additional radiation source.

50. The anodizing system according to claim 49 wherein said additional radiation is polychromatic.

51. The anodizing system according to claim 49 wherein said additional polychromatic radiation is at least one of ultraviolet radiation, visible radiation, and infrared radiation.

52. The anodizing system according to claim 49 wherein said additional radiation is monochromatic.

53. The anodizing system according to claim 49 wherein a spectral range of said at least one radiation source and a spectral range of said additional radiation source partially overlap.

54. The anodizing according to claim 53 wherein said partial overlap increases at least one of a signal ratio for the captured radiation and a total spectral range of captures radiation.

55. The anodizing system according to claim 49 wherein one of said at least one radiation source and said additional radiation source is visible radiation and the other of said at least radiation source and said additional radiation source is infrared radiation.

56. The anodizing system according to claim 30 said at least one probe further includes a collimator.

57. The anodizing system according to claim 56 wherein said collimator facilities a depth of field of a sufficient value to measure the anodized coating thickness.

58. The anodizing system according to claim 30 wherein said at least one probe is external to said bath.

59. The anodizing system according to claim 30 wherein the at least one probe is within said bath.

60. The anodizing system according to claim 30 wherein said at least one detector includes an interferometer.

61. The anodizing system according to claim 30 wherein said processing of the captured radiation to determine the coating thickness by said coating thickness monitor includes using at least one of:

a color, an interference pattern, an amount of absorbed radiation, an intensities ratio of a minimum reflected radiation wavelength and a maximum reflected radiation wavelength, and a Fast Fourier Transformation (FFT) of the captured radiation.

62. The anodizing system according to claim 30 wherein said processing of the captured radiation to determine the coating thickness by said coating thickness monitor includes using a Fast Fourier Transformation (FFT) of the captured radiation.