Method of manufacturing a nitride semiconductor laser with a plated auxiliary metal substrate
First Claim
1. A method of manufacturing a nitride semiconductor laser having a plurality of crystal layers made of group III nitride semiconductors including an active layer and successively stacked on an underlayer made of a group III nitride semiconductor, comprising the steps of:
- forming a plurality of crystal layers on the underlayer formed on a first substrate;
forming an electrode layer on an outermost surface of said crystal layers;
plating with metal the electrode layer to form an auxiliary substrate with which the plurality of crystal layers is lined;
irradiating an interface between the first substrate and said underlayer with light to form a region of decomposed substances of the nitride semiconductor;
delaminating said underlayer that supports said crystal layers, from said first substrate along the decomposed substance region; and
cleaving said underlayer with said crystal layers thereon together with the auxiliary substrate to form cleaved mirrors.
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Abstract
The disclosure is a method of manufacturing a nitride semiconductor laser wherein a plurality of crystal layers made of group III nitride semiconductors, including an active layer, are successively stacked on an underlayer. The method includes the steps of forming the plurality of crystal layers on the underlayer formed on a substrate, forming an electrode layer on the outermost surface of the crystal layers, plating a metal film onto the electrode layer, irradiating an interface between the substrate and the underlayer with light through the substrate toward so as to form a region of decomposed substances of the nitride semiconductor, delaminating the underlayer that supports the crystal layers from the substrate along the decomposed substance region, and cleaving the underlayer with the crystal layers so as to form cleaved planes constituting a laser resonator.
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Citations
15 Claims
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1. A method of manufacturing a nitride semiconductor laser having a plurality of crystal layers made of group III nitride semiconductors including an active layer and successively stacked on an underlayer made of a group III nitride semiconductor, comprising the steps of:
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forming a plurality of crystal layers on the underlayer formed on a first substrate;
forming an electrode layer on an outermost surface of said crystal layers;
plating with metal the electrode layer to form an auxiliary substrate with which the plurality of crystal layers is lined;
irradiating an interface between the first substrate and said underlayer with light to form a region of decomposed substances of the nitride semiconductor;
delaminating said underlayer that supports said crystal layers, from said first substrate along the decomposed substance region; and
cleaving said underlayer with said crystal layers thereon together with the auxiliary substrate to form cleaved mirrors. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for separating a first substrate from a nitride semiconductor wafer which is obtained by successively stacking at least one crystal layer made of group III nitride semiconductor on the first substrate, comprising the steps of:
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plating with metal an outermost surface of the crystal layer to form an auxiliary substrate with which the crystal layer is lined;
irradiating an interface between the first substrate and said crystal layer through the first substrate to form a region of decomposed substances of the nitride semiconductor; and
delaminating said crystal layer together with the auxiliary substrate from said first substrate along the decomposed substance region. - View Dependent Claims (11, 12, 13, 14, 15)
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Specification