Endpoint detection in the etching of dielectric layers
First Claim
1. A method of manufacturing a miniature multilayer device in which a low open area dielectric layer is selectively etched through to an underlying conductive region using an electrically conductive medium such that during said etching the partially etched and non-etched areas represent parallel capacitors, wherein the endpoint of the etch process is determined by detecting the abrupt change in total capacitance across the device just as the final portion of the dielectric layer is removed.
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Accused Products
Abstract
In a method of manufacturing a miniature multilayer device 10 a low open area dielectric layer 18 is selectively etched through to an underlying conductive region 16 using an electrically conducting medium such as a plasma 24. The endpoint of the etch process is determined by detecting the abrupt change in capacitance across the device 10 just as the final portion of the dielectric layer is removed.
49 Citations
9 Claims
- 1. A method of manufacturing a miniature multilayer device in which a low open area dielectric layer is selectively etched through to an underlying conductive region using an electrically conductive medium such that during said etching the partially etched and non-etched areas represent parallel capacitors, wherein the endpoint of the etch process is determined by detecting the abrupt change in total capacitance across the device just as the final portion of the dielectric layer is removed.
Specification