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Method for implementing a 6-mask cathode process

  • US 6,677,705 B2
  • Filed: 09/28/2001
  • Issued: 01/13/2004
  • Est. Priority Date: 09/28/2001
  • Status: Expired due to Fees
First Claim
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1. In a cathode connection array for a flat panel display, said cathode connection array having a base structure, said base structure comprising an inter-layer dielectric disposed upon a glass substrate, said inter-layer dielectric covering a first metallic conductor, said first metallic conductor disposed upon at least a part of said glass substrate in a first conductor pad area, and a second metallic conductor, said second metallic conductor disposed upon at least a part of said inter-layer dielectric in a second conductor pad area, said second conductor covered by a layer of chromium, a method of forming a direct via for an electrical access to said first and said second metallic conductors, said method comprising:

  • depositing a passivation layer upon said base structure;

    patterning said passivation layer;

    etching said passivation layer accordingly; and

    etching said inter-layer dielectric accordingly;

    wherein said method does not require deposition of a photoresistive mask for etching said direct via nor process steps corresponding to deposition thereof.

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