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Method of making self-cleaning substrates

  • US 6,679,978 B2
  • Filed: 02/22/2002
  • Issued: 01/20/2004
  • Est. Priority Date: 02/22/2002
  • Status: Expired due to Fees
First Claim
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1. A method of making a self-cleaning substrate, the method comprisingdepositing by chemical vapor deposition an alkali metal diffusion barrier layer on a substrate;

  • sputtering an ultraviolet radiation activated layer on the alkali metal diffusion barrier layer at a temperature of 100°

    C. or less; and

    , without heating above 100°

    C., exposing the ultraviolet radiation activated layer to ultraviolet radiation to form the self-cleaning substrate.

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