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Apparatus and method for depositing large area coatings on non-planar surfaces

  • US 6,681,716 B2
  • Filed: 11/27/2001
  • Issued: 01/27/2004
  • Est. Priority Date: 11/27/2001
  • Status: Expired due to Term
First Claim
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1. An apparatus for depositing a uniform, coating on a surface of a non-planar substrate, said apparatus comprising:

  • a) at least one array of a plurality of plasma sources for generating a plurality of plasmas, wherein each of said plurality of plasma sources includes a cathode, an anode, and an inlet for a non-reactive plasma source gas disposed in a plasma chamber which is maintained at a first predetermined pressure;

    b) a deposition chamber for containing said non-planar substrate, wherein said deposition chamber is in fluid communication with said plasma chamber, and wherein said deposition chamber is maintained at a second predetermined pressure, said second predetermined pressure being less than said first predetermined pressure;

    c) at least one reactant gas injector disposed in said deposition chamber between said at least one array and said non-planar substrate for providing a differential flow rate of at least one reactant gas into each of said plurality of plasmas, such that said plurality of plasmas impinges upon a first region of said surface of said non-planar substrate and a second region of said surface of said non-planar substrate to form a coating of substantially uniform thickness, wherein said first region is located at a first working distance from said plurality of plasma sources and said second region is located at a second working distance from said plurality of plasma sources, said first working distance being greater than said second working distance.

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