Microloading effect correction

• US 6,684,382 B2
• Filed: 08/31/2001
• Issued: 01/27/2004
• Est. Priority Date: 08/31/2001
• Status: Active Grant

• Current Assignee: Synopsys Incorporated
• Original Assignee: Numerical Technologies Inc. (Synopsys Incorporated)
• Inventors: Liu, Hua-Yu
• Primary Examiner(s): Niebling, John F.
• Assistant Examiner(s): Whitmore, Stacy
• Application Number:
  US09/945,012
• Publication Number:
  US 20030046653A1
• Time in Patent Office: 879 Days
• Field of Search: 716/19
• US Class Current: 716/52
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 1/68 Preparation processes not covered by groups G03F1/20 - G03F1/50

Abstract

A method and apparatus for providing correction for microloading effects is described. Hybrid proximity correction techniques are used to make the problem computationally more feasible. More specifically, feature edges in a layout can be grouped into those edges, or edge segments, with a large edge separation (group B), e.g. greater than n, and those having less than that separation (group A). The group B features can then be corrected for microloading effects rapidly using rules based correction. Then both groups of edges can be corrected using model based optical proximity correction using the output of the rule based correction as the ideal, or reference, layout.

Claims

1. A computer program product for optical proximity correction (OPC) of a layout for a layer of material in an integrated circuit (IC) for optical and etch effects, the computer program product comprising:

a first set of instructions for accessing rules for etch correction and a model for optical correction;

a second set of ins ructions for grouping features in the layout based on edge separation into a first group having a separation greater than a predetermined amount and a second group;

a third set of instructions for performing correction on edges in the first group for etch effects;

a fourth set of instructions for performing Correction on edges in the first group and the second group for optical effects, the fourth set of instructions using modified position of edges generated by the third set of instructions as ideal shape for corrections.

2. The computer program product of claim 1, wherein the first set of instructions further comprises at least one of:

a fifth set of instructions to construct rules for etch correction based on critical dimension etch measurements taken from a wafer exposed to a test pattern, and

a sixth set of instructions to generate a model for optical and resist correction based on critical dimension resist measurements taken from a wafer exposed to a test pattern.

3. The computer program product of claim 1, wherein etch effects comprise micro loading effects from variable etch rates due to different densities and sizes for features in the layout.

4. The computer program product of claim 1, wherein the layout comprises a layout describing one or more masks for defining the layer of material using phase shifting.

5. The computer program product of claim 1, wherein the layout formatted according to at least one of a GDS-II stream format, a mask electron beam exposure system (MEBES) format, a Gerber format, and an electronic design interchange format (EDIF).

6. The computer program product of claim 1, wherein the computer program product embodied in at least one of a compact disc, a digital versatile disc (DVD), and a hard drive.

7. A method for performing optical proximity correction (OPC) of a layout for a layer of material in an integrated circuit (IC) for optical and etch effects, the method comprising:

modifying the layout using a first correction process for etch effects; and

modifying the layout using a second correction process for optical effects, the second correction using the layout generated by the first correction process as ideal shape for corrections,

wherein the first correction process corn rises a rule based correction and the second correction process comprises a model based correction process.

8. The method of claim 7, wherein the layout comprised of a plurality of edges, the plurality of edges forming a plurality of features, and wherein the modifying the layout using a first correction process further comprises applying the first correct ion process only to edges having a feature separation over a predetermined amount, n, from edges of other features in the layout.

9. The method of claim 8, wherein n comprises 1.5 μ

m.

10. The method of claim 7, wherein etch effects comprise micro loading effects from variable etch rates due to different densities and sizes for features in the layout.

11. The method of claim 7, wherein optical effects comprise optical and resist effects from optical properties and resist properties of lithography system.

12. An apparatus for optical proximity correction (OPC) of a layout for a layer of material in an integrated circuit (IC) for optical and etch effects, the apparatus comprising:

a first means for correcting the layout for etch effects; and

a second means for correcting the layout for optical effects using the layout generated by the first means as ideal shape for corrections,

wherein the first means further comprises a means for performing rule based correction for etch effects and the second means further comprises means for model based correction for optical effects.

13. The apparatus of claim 12, wherein the layout comprised of a plurality of edges, the plurality of edges forming a plurality of features, and wherein the first means further comprises means for correcting only edges having a feature separation over a predetermined amount, n, from edges of other features in the layout.

14. The apparatus of claim 13, wherein n comprises 1.5 μ

m.

15. The apparatus of claim 12, wherein etch effects comprise micro loading effects from variable etch rates due to different densities and sizes for features in the layout.

16. The apparatus of claim 12, wherein optical effects comprise optical and resist effects from optical properties and resist properties of lithography system.