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Pattern generator using EUV

  • US 6,687,041 B1
  • Filed: 08/31/2000
  • Issued: 02/03/2004
  • Est. Priority Date: 03/02/1998
  • Status: Expired due to Term
First Claim
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1. An apparatus for creating a pattern with extremely high resolution on a workpiece, such as a pattern on a semiconductor chip with 50 nm wide lines, comprising:

  • a source for emitting electromagnetic radiation in the EUV wavelength range, a spatial modulator having a multitude of modulating elements (pixels), adapted to being illuminated by said radiation a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, extracting from the digital description a sequence of partial patterns, converting said partial patterns to modulator signals, and feeding said signals to the modulator, a precision mechanical system for moving said workpiece and/or projection system relative to each other, and an electronic control system coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns.

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