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EEPROM flash memory erasable line by line

  • US 6,687,167 B2
  • Filed: 08/20/2002
  • Issued: 02/03/2004
  • Est. Priority Date: 08/30/2001
  • Status: Active Grant
First Claim
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1. An EEPROM flash memory capable of being erased line by line and comprising:

  • a matrix (MEM) of cells connected to each other by means of row lines and column lines, row decoder circuits (DEC) comprising logic decoder units (DECx-z), voltage level conversion units (LSHx-z) and interface logic stages (ILOG) between the level conversion units (LSHx-z) and the row lines of the matrix, each interface stage comprising elementary row driving stages, each of which has inputs connected to corresponding outputs of the level conversion units (LSHx-z), an output connected to a row line (WL) and a first (SUPPLY_P) and a second (SUPPLY_N) supply voltage terminal and comprises a first branch comprising a first MOS transistor (P01) of a first type, connected with its source drain-path between the output (WL) and the first (SUPPLY_P) supply terminal and a second branch comprising a second MOS transistor (N01) of second type, connected with its source-drain path between the output (WL) and the second (SUPPLY_N) supply terminal, the gate terminals of the first and the second MOS transistor being two inputs of the elementary row driving stage, characterized in that each elementary row pilot stage comprises;

    in the first branch a first supplementary MOS transistor (N00) of the second type (n), connected with its source-drain path in series with the first MOS transistor (P01) and with its gate terminal connected to a first biasing terminal (NRM), and in the second branch a second supplementary MOS transistor (P00) of the first type (p), connected with its source-drain path in series with the source-drain path of the second MOS transistor (N01) of the second type (n) and with its gate terminal connected to a second biasing terminal (GPMOS).

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