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Wafer support system

  • US 6,692,576 B2
  • Filed: 09/13/2002
  • Issued: 02/17/2004
  • Est. Priority Date: 09/01/1995
  • Status: Expired due to Fees
First Claim
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1. An apparatus for processing a semiconductor wafer, comprising a substantially disc-shaped susceptor having one or more gas flow passages formed therein, each of said one or more passages having an upper opening at an upper surface of the susceptor and a lower opening at a lower surface of the susceptor, the lower surface of the susceptor having three or more cavities positioned along a circle centered about a central vertical axis of the susceptor, the cavities configured to receive upper ends of support arms of a multi-armed support member configured to support and rotate the susceptor about the central vertical axis.

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