Thin film forming device, method of forming a thin, and self-light-emitting device

• US 6,699,739 B2
• Filed: 03/02/2001
• Issued: 03/02/2004
• Est. Priority Date: 03/06/2000
• Status: Expired due to Term

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Hiroki, Masaaki, Yamazaki, Shunpei, Ishimaru, Noriko
• Primary Examiner(s): Lebentritt, Michael S.
• Assistant Examiner(s): Luhrs, Michael K.
• Application Number:
  US09/798,608
• Publication Number:
  US 20020031874A1
• Time in Patent Office: 1,096 Days
• Field of Search: 438/22, 438/28, 438/30, 438/35, 438/89, 438/96, 438/942
• US Class Current: 438/156
• CPC Class Codes: C23C 14/042 using masks
• CPC Class Codes: H10K 59/00 Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
• CPC Class Codes: H10K 59/12 Active-matrix OLED [AMOLED] displays
• CPC Class Codes: H10K 59/17 Passive-matrix OLED displays
• CPC Class Codes: H10K 59/35 comprising red-green-blue [RGB] subpixels
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/164 using vacuum deposition
• CPC Class Codes: H10K 71/166 using selective deposition, e.g. using a mask
• CPC Class Codes: H10K 85/30 Coordination compounds
• CPC Class Codes: H10K 85/311 Phthalocyanine
• CPC Class Codes: H10K 85/342 comprising iridium
• CPC Class Codes: H10K 85/346 comprising platinum
• CPC Class Codes: H10K 85/653 comprising only oxygen as heteroatom
• CPC Class Codes: Y10S 438/942 Masking

Abstract

Measure of forming an EL layer by selectively depositing through evaporation a material for forming the EL layer at a desired location is provided. When a material for forming an EL layer is deposited, a mask (113) is provided between a sample boat (111) and a substrate (110). By applying voltage to the mask (113), the direction of progress of the material for forming the EL layer is controlled to be selectively deposited at a desired location.

Claims

1. A method of forming a thin film, wherein a sample boat having an EL material contained therein a substrate having an electrode provided thereon, and a mask between the sample boat and the substrate are provided,

wherein the EL material is made to be in a vapor state in the sample boat,

wherein the EL material in the vapor state is discharged from the sample boat toward the substrate,

wherein the EL material in the vapor state is made to pass through an opening of the mask corresponding to the electrode, and to deposit the EL material on the electrode over the substrate in order to form a thin film, and

wherein voltage is applied to the mask in order to control the deposition location of the EL material, and

wherein voltage is applied to the electrode in order to control the deposition location of the EL material.

2. A method of forming a thin film,

wherein a sample boat having an EL material contained therein, a substrate having an electrode provided thereon, and a mask between the sample boat and the substrate are provided,

wherein the EL material is made to be in a vapor state in the sample boat, wherein the EL material in the vapor state is discharged from the sample boat toward the substrate,

wherein the EL material in the vapor state is made to pass through an opening of the mask corresponding to the electrode, and to deposit the EL material on the electrode over the substrate in order to form a thin film, and

wherein voltage is applied to the mask in order to control the deposition location of the EL material, and

wherein the EL material in a vapor state is charged when the EL material is made to be in a vapor state in the sample boat, and is discharged from the sample boat toward the substrate.

3. A method of manufacturing an EL display device comprising a plurality of pixels over a substrate, the method comprising:

making an EL material to be in a vapor state in a sample boat;

discharging the EL material in a vapor state from the sample boat toward the substrate;

passing the EL material in the vapor state through an opening of a first mask provided between the sample boat and the substrate,

wherein voltage is applied to the first mask in order to control the deposition location of the EL material, and

wherein each of the plurality of pixels comprises a plurality of pixel electrodes, and the EL material is selectively deposited over the plurality of pixel electrodes, and

wherein voltage is applied to the pixel electrode in order to control the deposition location of the EL material.

4. A method of manufacturing an EL display device comprising:

making an EL material to be in a vapor state in a sample boat;

discharging the EL material in a vapor state from the sample boat toward a pixel electrode over a substrate;

passing the EL material in the vapor state through an opening of a first mask provided between the sample boat and the substrate;

wherein the voltage is applied to the first mask in order to control the deposition location of the EL material, and

wherein the EL material in the vapor state is charged when the EL material is made to be in the vapor state and discharge from the sample boat.

5. A method of manufacturing an EL display device according to claim 4, wherein voltage is applied to the pixel electrode in order to control the deposition location of the EL material.

6. A method of manufacturing an EL display device according to claim 4, wherein another at least one second mask is provided between the sample boat and the substrate, and different voltages are applied to each of the first and second masks.

7. A method of manufacturing an EL display device according to claim 4, wherein the mask is a mesh-like-structure formed of conductive material, a plate-like structure formed of conductive material, or a stripe-like structure formed of conductive material.

8. An EL display device according to claim 4, wherein the EL display device is incorporated into an electronic apparatus selected from the group consisting of a video camera, a head fitting type display, an image playback device, a mobile computer, a personal computer, a portable telephone, and an audio reproducing device.

9. A method of forming a thin film,

wherein a sample boat having an EL material contained therein, a substrate having an electrode provided thereon, and a mask between the sample boat and the substrate are provided,

wherein the EL material is made to be in a vapor state in the sample boat,

wherein the EL material in the vapor state is discharged from the sample boat toward the substrate,

wherein the EL material in the vapor state is made to pass through an opening of the mask corresponding to the electrode, and to deposit the EL material on the electrode over the substrate in order to form a thin film, and

wherein voltage is applied to the mask in order to control the deposition location of the EL material by controlling a direction of progress thereof.

10. A method of forming a thin film as claimed in claims 9, wherein the mask comprises a plurality of blocking portions, and the opening in the mask is a gap between blocking portions.

11. A method of forming a thin film as claimed in claim 9, wherein another at least one mask is provided between the sample boat and the substrate, and different voltages are applied to each of masks.

12. A method of forming a thin film as claimed in claim 9, wherein the electrode is a pixel electrode.

13. A method of forming a thin film as claimed in claim 9, wherein the EL material is a low molecular weight material.

14. A method of forming a thin film as claimed in claims 9, wherein the thickness of the thin film is 10 nm to 10 μ

m.

15. A method of forming a thin film as claimed in claim 9, wherein the mask is a mesh-like structure formed of conductive material, a plate-like structure formed of a conductive material, or a stripe-like structure formed of conductive material.

16. A self-light-emitting device manufactured using a method of forming a thin film as claimed in claim 9.

17. A method of forming a thin film as claimed in claim 9,

wherein voltage is applied to the electrode in order to control the deposition location of EL material.

18. A method of forming a thin film as claimed in claim 9,

wherein the EL material in a vapor state is charged when the EL material is made to be in a vapor state in the sample boat, and is discharged from the sample boat toward the substrate.

22. An EL display device according to claim 9, wherein the EL display device is incorporated into an electronic apparatus selected from the group consisting of a video camera, a head fitting type display, an image playback device, a mobile computer, a personal computer, a portable telephone, and an audio reproducing device.

19. A method of manufacturing an EL display device comprising a plurality of pixels over a substrate, the method comprising:

making an EL material to be in a vapor state in a sample boat;

discharging the EL material in a vapor state from the sample boat toward the substrate;

passing the EL material in the vapor state through an opening of a first mask provided between the sample boat and the substrate,

wherein voltage is applied to the first mask in order to control the deposition location of the EL material, and

wherein each of the plurality of pixels comprises a plurality of pixel electrodes, and the EL material is selectively deposited over the plurality of pixel electrodes by controlling a direction of progress thereof.

20. A method of manufacturing an EL display device according to claim 19, wherein at least one second mask is provided between the sample boat and the substrate, and different voltages are applied to each of the first and second masks.

21. A method of manufacturing an EL display device according to claim 19, wherein the mask is a mesh-like structure formed of conductive material, a plate-like structure formed of a conductive material, or a stripe-like structure formed of conductive material.

23. A method of manufacturing an EL display device according to claim 19, wherein voltage is applied to the pixel electrode in order to control the deposition location of the EL material.