Emission monitoring system and method

• US 6,701,255 B2
• Filed: 04/30/2001
• Issued: 03/02/2004
• Est. Priority Date: 04/28/2000
• Status: Expired due to Term

• Current Assignee: PPL Energy Supply LLC (Talen Energy Corporation)
• Original Assignee: PPL Electric Utilities Corporation (PPL Corporation)
• Inventors: Romero, Carlos E., Levy, Edward K., Batug, James P., Moyer, Noel, Yilmaz, Ali
• Primary Examiner(s): Barlow, John
• Assistant Examiner(s): BHAT, ADITYA S
• Application Number:
  US09/844,282
• Publication Number:
  US 20020059033A1
• Time in Patent Office: 1,037 Days
• Field of Search: 702/1, 702/24, 700/31, 436/161, 422/62, 250/338.5, 738/632.1, 731/16, 73/233.1, 602/74, 123/3
• US Class Current: 702/24
• CPC Class Codes: G01N 1/2258 in a stack or chimney
• CPC Class Codes: G01N 2001/2264 with dilution
• CPC Class Codes: G01N 33/0018 by diluting a gas
• CPC Class Codes: G01N 33/0037 NOx
• CPC Class Codes: G01N 33/004 CO or CO2
• CPC Class Codes: G01N 33/0042 SO2 or SO3
• CPC Class Codes: Y02A 50/20 Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters

Abstract

An emission measuring system and method provide an accurate, real-time calculation of a particular material emitted from an emission source. Specifically, a CEM system installed in an industrial stack can include a dilution probe located in the stack and a data analyzer that records and analyzes characteristic data of the materials sampled by the dilution probe. A dilution ratio is used to correct for the addition of dilution gas into the stack gas sample to determine the concentration of a particular material that is being emitted from the stack. The dilution ratio is based on a molar flow rate, which can be determined by using specific algorithms and measurements.

Claims

1. An emission measuring device comprising:

an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source,

means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value, and

a dilution probe that receives emitted material and dilution gas which forms a mixture known as diluted sample gas, and that is in communication with the analyzer, said mass flow rate value being a value corresponding to one of a mass flow rate of dilution gas, a mass flow rate of sample gas, and a mass flow rate of emitted material.

2. The emission measuring device of claim 1, wherein the dilution probe is located in one of a stack and a duct.

3. An emission measuring device comprising:

an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source,

means connected in the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value; and

a dilution probe connected to said means for calculating and configured to receive a sample gas that includes the emitted material and a dilution gas,

wherein the means for calculating the amount of a particular material calculates by using a dilution ratio based on the mass flow rate value, and

wherein the dilution ratio is determined as follows;

$D=1+\frac{565.338<br><br>\text{\hspace{1em}<br><br>}<br><br>F_{\mathrm{da}}<br><br>\sqrt{T_{\mathrm{stack}}}<br><br>\sqrt{M}<br><br>\left[1+y<br><br>\left(T_{\mathrm{stack}}-530\right)\right]}{{P_{\mathrm{absolute}}<br><br>\left[1+\mathrm{\beta <br><br>}<br><br>\left(T_{\mathrm{stack}}-530\right)\right]}^2}$

 

where D is the dilution ratio, F_da is a mass flow rate of the dilution gas, T_stack is an emission source temperature, M is a molecular weight of the emitted material, Y is a constant, P_absolute is total emission source pressure, and β

is a thermal expansion coefficient of orifice material located on the dilution probe.

4. An emission measuring device comprising:

an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source; and

means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value,

wherein the means for calculating the amount of a particular material calculates by using a dilution ratio based on the mass flow rate value, and

wherein the dilution ration is determined as follows;

5. An emission measuring device comprising:

an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source; and

means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value,

wherein the means for calculating the amount of a particular material calculates by using a dilution ration based on the mass flow rate value, and

wherein the dilution ration is determined as follows;

6. An emission measuring device comprising:

an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source; and

means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value; and

a dilution probe connected to said means for calculating, wherein the emitted material is combined with a dilution gas to form a sample gas, and the means for calculating the amount of a particular material calculates by using a mass flow rate of sample gas determined as follows;

$m_s=\mathrm{\alpha <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>C_d<br><br>\frac{P_{\mathrm{absolute}}<br><br>\sqrt{M}<br><br>{A_o<br><br>\left[1+\mathrm{\beta <br><br>}<br><br>\left(T_{\mathrm{stack}}-530\right)\right]}^2}{\sqrt{T_{\mathrm{stack}}}}$

 

where m_s is a mass flow rate of the sample gas, is a constant, C_d is a discharge coefficient, P_absolute is a total emission source pressure, M is a molecular weight of the sample gas, β

is a thermal expansion coefficient of an orifice material of the dilution probe, A_o is a throat area of a critical orifice of the dilution probe, and T_stack is an emission source temperature.

7. The emission measuring device of claim 6, wherein T_stack is the critical orifice upstream staguation temperature.

8. The emission measuring device of claim 6, wherein P_absolute is the critical orifice upstream stagnation pressure.

9. An emission measuring device comprising:

an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source; and

means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value,

wherein the means for calculating includes a data analyzer that is adapted for use with an existing plant data handling and acquisition system.

10. The emission measuring device of claim 9, wherein the data analyzer includes an output line that can be connected to the existing plant data handling and acquisition system to transfer dilution ration data.

11. A system for use with an emission source comprising:

a data medium for receiving emission data collected from one of an analyzer and a transmitter, the emission data including one of a pressure, a temperature, and an amount of a particular material emitted from the emission source;

means for calculating an amount of the particular material emitted from the emission source using a mass flow rate value; and

a dilution probe connected to said means for calculating and configured to receive a sample gas that includes said emitted material and a dilution gas,

wherein the mass flow rate value includes a mass flow rate of a sample gas and said mass flow rate of the sample gas is calculated as follows;

$m_s=\mathrm{\alpha <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>C_d<br><br>\frac{P_{\mathrm{absolute}}<br><br>\sqrt{M}<br><br>{A_o<br><br>\left[1+\mathrm{\beta <br><br>}<br><br>\left(T_{\mathrm{stack}}-530\right)\right]}^2}{\sqrt{T_{\mathrm{stack}}}}$

 

where m_s is a mass flow rate of sample gas, is a constant, C_d is a discharge coefficient, P_absolute is total emission source pressure, M is a molecular weight of the sample gas, β

is a thermal expansion coefficient of an orifice material of the dilution probe, A_o is a throat area of a critical orifice of the dilution probe, and T_stack is an emission source temperature.

12. A system for use with an emission source comprising:

a data medium for receiving emission data collected from one of an analyzer and a transmitter, the emission data including one of a pressure, a temperature, and an amount of a particular material emitted from the emission source;

means for calculating an amount of the particular material emitted from the emission source using a mass flow rate value; and

a dilution probe that has an orifice for receiving a sample gas which includes the particular material combined with a dilution gas, wherein the means for calculating an amount of the particular material emitted from the emission source calculates a concentration of the particular material using a dilution ration as follows;

$D=1+\frac{565.338<br><br>\text{\hspace{1em}<br><br>}<br><br>F_{\mathrm{da}}<br><br>\sqrt{T_{\mathrm{stack}}}<br><br>\sqrt{M}<br><br>\left[1+y<br><br>\left(T_{\mathrm{stack}}-530\right)\right]}{{P_{\mathrm{absolute}}<br><br>\left[1+\mathrm{\beta <br><br>}<br><br>\left(T_{\mathrm{stack}}-530\right)\right]}^2}$

 

where D is the dilution ratio, F_da is a mass flow rate of dilution gas, T_stack is an emission source temperature, M is a molecular weight of the sample gas, y is a constant, P_absolute is total emission source pressure, and β

is a thermal expansion coefficient of an orifice material of the dilution probe.

13. A system for use with an emission source comprising;

a data medium for receiving emission data collected from one of an analyser and a transmitter, the emission data including one of a pressure, a temperature, and an amount of a particular material emitted from the emission source; and

means for calculating an amount of the particular material emitted from the emission source using a mass flow rate value,

where the means for calculating an amount of the particular material emitted from the emission source calculates a concentration of the particular material using a dilution ratio as follows;

14. A system for use with an emission source comprising:

a data medium for receiving emission data collected from one of an analyzer and a transmitter, the emission data including one of a pressure, a temperature, and an amount of a particular material emitted from the emission source; and

means for calculating an amount of the particular material emitted from the emission source using a mass flow rate value,

wherein the means for calculating an amount of the particular material emitted from the emission source calculates an concentration of the particular material using a dilution ratio; and

a dilution probe connected to an analyzer, the analyzer connected in communication with the means for calculating a total amount of a particular material.

15. A system for use with an emission source comprising:

a data medium for receiving emission data collected from one of an analyzer and a transmitter, the emission data including one of a pressure, a temperature, and an amount of a particular material emitted from the emission source; and

means for calculating an amount of the particular material emitted from the emission source using a mass flow rate value,

wherein the means for calculating includes a data analyzer that is adapted for use with an existing plant data handling and acquisition system.

16. The system for use with an emission source of claim 15, wherein the data analyzer includes an output line that can be connected to an existing plant data handling and acquisition system to transfer dilution ratio data.

17. A method for calculating an amount of a material emitted from a source, comprising the steps of:

sensing an emission gas emitted from the source;

determining a mass flow rate value of the emission gas;

calculating a dilution ration based on the determined mass flow rate value of the emission gas; and

determining a characteristic of the emission gas using the calculated dilution ratio,

wherein the step of sensing includes using a dilution probe configured to receive a sample gas that includes the emission gas and a dilution gas.

18. The method of claim 17, wherein the step of calculating a dilution ratio includes calculating the dilution ration as follows:

$D=1+\frac{565.338<br><br>\text{\hspace{1em}<br><br>}<br><br>F_{\mathrm{da}}<br><br>\sqrt{T_{\mathrm{stack}}}<br><br>\sqrt{M}<br><br>\left[1+y<br><br>\left(T_{\mathrm{stack}}-530\right)\right]}{{P_{\mathrm{absolute}}<br><br>\left[1+\mathrm{\beta <br><br>}<br><br>\left(T_{\mathrm{stack}}-530\right)\right]}^2}$

where D is the dilution ratio, F_da is a mass flow of dilution gas, T_stack is an emission gas temperature, M is the molecular weight of the sample gas, y is a constant, P_absolute is total emission source pressure, and β

is a thermal expansion coefficient of an orifice material of the dilution probe.

19. The method of claim 17, wherein the step of calculating a dilution ratio includes calculating the dilution ratio as follows:

20. The method of claim 17, wherein said step of determining a mass flow rate includes determining the mass flow rate as follows:

$m_s=\mathrm{\alpha <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>C_d<br><br>\frac{P_{\mathrm{absolute}}<br><br>\sqrt{M}<br><br>{A_o<br><br>\left[1+\mathrm{\beta <br><br>}<br><br>\left(T_{\mathrm{stack}}-530\right)\right]}^2}{\sqrt{T_{\mathrm{stack}}}}$

where m_c is a mass flow rate of emission gas, is a constant, C_d is a discharge coefficient, P_absolute is total emission gas pressure, M is a molecular weight of the sample gas, β

is a thermal expansion coefficient of an orifice material of the dilution probe, A_o is a throat area of a critical orifice of the dilution probe, and T_stack is an emission gas temperature.

21. A method for calculating an amount of a material emitted from a source, comprising the steps of:

sensing an emission gas emitted from the source;

determining a mass flow rate value of the emission gas;

calculating a dilution ratio based on the determined mass flow rate value of the emission gas; and

determining a characteristic of the emission gas using th calculated dilution ratio,

wherein the step of calculating includes providing a data analyzer to perform the calculation of the dilution ratio, the data analyzer being capable of retrofitting in an existing data handling and acquisition system at an industrial facility.

22. An emission measuring device comprising:

an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source; and

a data system connected to the analyzer and configured to calculate an amount of a particular material contained in the emitted material by using a molar flow rate value,

wherein the data system calculates a concentration of the particular material using a dilution ratio, and the dilution ratio is calculated as follows;