Method of grinding rear side of semiconductor wafer

• US 6,702,652 B2
• Filed: 07/19/2002
• Issued: 03/09/2004
• Est. Priority Date: 08/03/2001
• Status: Active Grant

• Current Assignee: Disco Corporation
• Original Assignee: Disco Corporation
• Inventors: Arai, Kazuhisa
• Primary Examiner(s): Morgan, Eileen P.
• Application Number:
  US10/197,754
• Publication Number:
  US 20030027501A1
• Time in Patent Office: 599 Days
• Field of Search: 451/41, 451/59, 451/63, 451/54, 438/692, 438/693, 156/345.11, 156/345.12
• US Class Current: 451/41
• CPC Class Codes: B24B 1/00 Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
• CPC Class Codes: B24B 41/061 axially supporting turning workpieces, e.g. magnetically, pneumatically
• CPC Class Codes: B24B 7/228 for grinding thin, brittle parts, e.g. semiconductors, wafers grinding edges of thin, brittle parts B24B9/065

Abstract

A method of grinding the rear side of a semiconductor wafer, the front side of which has bumps formed thereon, includes the steps of: preparing semiconductor wafers whose front surfaces have a plurality of circuits formed in their lattice patterns; coating the front side of a selected semiconductor wafer with a resist material to form a resist layer thereon; forming a plurality of holes in each section of the resist layer at which are to be formed bumps corresponding to the circuits by removing the resist; plating at the holes with a metal to form bumps; putting the semiconductor wafer on a selected chuck table with resist layer, which is formed on its front side, laid on the chuck table in a grinding machine; and grinding the rear side of the semiconductor wafer. The bumps are lower than the thickness of the resist layer, and therefore, they are short of reaching the front surface of the semiconductor wafer, and therefore, the semiconductor wafer can be protected from cracking, which otherwise would be caused by concentration of the stress to the bumps on the front side of the semiconductor wafer while grinding the rear side thereof.

Claims

1. A method of processing a semiconductor wafer, comprising:

coating a front surface of a semiconductor wafer with a resist material to form a resist layer thereon;

forming a plurality of holes in said resist layer to extend through said resist layer to said front surface of said semiconductor wafer;

forming a plurality of metal bumps to project as bumps from said front surface of said semiconductor wafer, each of said metal bumps being disposed in one of said plurality of holes formed in said resist layer;

positioning said semiconductor wafer, which has said metal bumps disposed in said holes of said resist layer, on a chuck table such that said resist layer is supported on said chuck table and said front surface of said semiconductor wafer faces said chuck table; and

grinding a rear surface of said semiconductor wafer while said semiconductor wafer is positioned on said chuck table.

2. A method according to claim 1, wherein

in said forming of said plurality of metal bumps, said metal bumps are formed so as to project from said front surface of said semiconductor wafer an amount so that said metal bumps are short of reaching a front surface of said resist layer, such that, when said semiconductor wafer is positioned on said chuck table, said resist layer supports said semiconductor wafer.

3. A method according to claim 2, further comprising

after said grinding of said rear surface of said semiconductor wafer, removing said resist layer from said front surface of said semiconductor wafer.

4. A method according to claim 1, further comprising

after said forming of said metal bumps, applying a protection tape to said resist layer such that, when said semiconductor wafer is positioned on said chuck table, said protection tape is in contact with said chuck table and supports said resist layer and said semiconductor wafer.

5. A method according to claim 4, further comprising

after said grinding of said rear surface of said semiconductor wafer, removing said resist layer from said front surface of said semiconductor wafer.

6. A method according to claim 4, wherein

in said forming of said plurality of metal bumps, said metal bumps are formed so as to project from said front surface of said semiconductor wafer an amount so that said metal bumps are short of reaching a front surface of said resist layer.

7. A method according to claim 6, wherein

said forming of said metal bumps comprises forming said metal bumps of gold or a soldering metal, such that each bump is 50 to 200 μ

m in diameter and 50 to 200 μ

m in height.

8. A method according to claim 4, wherein

said forming of said metal bumps comprises forming said metal bumps of gold or a soldering metal, such that each bump is 50 to 200 μ

m in diameter and 50 to 200 μ

m in height.

9. A method according to claim 2, wherein

said forming of said metal bumps comprises forming said metal bumps of gold or a soldering metal, such that each bump is 50 to 200 μ

m in diameter and 50 to 200 μ

m in height.

10. A method according to claim 1, wherein

said forming of said metal bumps comprises forming said metal bumps of gold or a soldering metal, such that each bump is 50 to 200 μ

m in diameter and 50 to 200 μ

m in height.

11. A method according to claim 1, further comprising

prior to coating the front surface of said semiconductor wafer with the resist material to form said resist layer, preparing a plurality of semiconductor wafers having front surfaces carrying a plurality of circuits formed in lattice patterns, and selecting said semiconductor wafer to be coated with said resist material from among said plurality of semiconductor wafers.

12. A method according to claim 1, further comprising

after said grinding of said rear surface of said semiconductor wafer, removing said resist layer from said front surface of said semiconductor wafer.