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Interconnect assemblies and methods

  • US 6,713,374 B2
  • Filed: 12/29/2000
  • Issued: 03/30/2004
  • Est. Priority Date: 07/30/1999
  • Status: Expired due to Fees
First Claim
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1. A method of forming a contact element comprising a base portion to adhere to an electronic device and a beam portion connected to said base portion and configured to slope away from said electronic device, said method comprising:

  • forming a first masking layer comprising a first opening, said first opening comprising a first region corresponding to said base portion and a second region defining said slope of said beam portion;

    depositing a conductive material into said first opening;

    forming a second masking layer comprising a second opening, wherein said second opening defines a planar shape of said beam portion; and

    depositing a contact element material into said second opening.

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