Group III nitride compound semiconductor device and method of producing the same
First Claim
Patent Images
1. A group III nitride compound semiconductor device, comprising:
- a substrate;
a first group III nitride compound layer having a thickness of from 50 Å
to 3000 Å and
being formed on said substrate by a method not using metal organic compounds as raw materials; and
a second group III nitride compound semiconductor layer being formed on said first group III nitride compound layer, wherein said substrate is at a temperature not less than 400°
C. when said first group III nitride compound semiconductor layer is formed thereon, and wherein said first group III nitride compound semiconductor layer is subjected to a heat treatment in a range of 1050°
C. to 1200°
C. before said second group III nitride compound semiconductor layer is formed thereon.
2 Assignments
0 Petitions
Accused Products
Abstract
A first group III nitride compound layer, which is formed on a substrate by a method not using metal organic compounds as raw materials, is heated in an atmosphere of a mixture gas containing a hydrogen or nitrogen gas and an ammonia gas, so that the crystallinity of a second group III nitride compound semiconductor layer formed on the first group III nitride compound layer is improved. When the first group III nitride compound layer is formed on a substrate by a sputtering method, the thickness of the first group III nitride compound layer is set to be in a range of from 50 Å to 3000 Å.
47 Citations
37 Claims
-
1. A group III nitride compound semiconductor device, comprising:
-
a substrate;
a first group III nitride compound layer having a thickness of from 50 Å
to 3000 Å and
being formed on said substrate by a method not using metal organic compounds as raw materials; and
a second group III nitride compound semiconductor layer being formed on said first group III nitride compound layer, wherein said substrate is at a temperature not less than 400°
C. when said first group III nitride compound semiconductor layer is formed thereon, andwherein said first group III nitride compound semiconductor layer is subjected to a heat treatment in a range of 1050°
C. to 1200°
C. before said second group III nitride compound semiconductor layer is formed thereon.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 16, 17, 18, 19, 20, 21, 23, 24, 25)
-
-
10. A group III nitride compound semiconductor device, comprising:
-
a substrate;
a first group III nitride compound semiconductor layer having a thickness of from 50 Å
to 3000 Å and
being formed on said substrate by a method not using metal organic compounds as raw materials; and
a second group III nitride compound semiconductor layer being formed on said first group III nitride compound layer, wherein said second group III nitride compound semiconductor layer is formed by a metal organic chemical vapor deposition method, and wherein said first group III nitride compound semiconductor layer is subjected to a heat treatment in a range of 1050°
C. to 1200°
C. before said second group III nitride compound semiconductor layer is formed thereon.- View Dependent Claims (26, 27, 28)
-
-
11. A group III nitride compound semiconductor device, comprising:
-
a sapphire substrate;
a first group III nitride compound semiconductor layer having a thickness of from 50 Å
to 3000 Å and
being formed on said sapphire substrate by a sputtering method; and
a second group III nitride compound semiconductor layer formed on said first group III nitride compound semiconductor layer by a metal organic chemical vapor deposition method, wherein said first group III nitride compound semiconductor layer is subjected to a heat treatment in a range of 1050°
C. to 1200°
C. before said second group III nitride compound semiconductor layer is formed thereon.- View Dependent Claims (12, 13, 14, 29, 30, 31)
-
-
15. A group III nitride compound semiconductor device, comprising:
-
a buffer layer comprising a first group III nitride compound semiconductor layer; and
a second group III nitride compound semiconductor layer formed on said buffer layer;
wherein said buffer layer is formed on a substrate having a temperature not less than 400°
C. by a method not using metal organic compounds as raw materials and is heated in an atmosphere of a mixture of gases containing hydrogen or nitrogen gas and ammonia gas before formation of said second group III nitride compound semiconductor layer, andwherein said first group III nitride compound semiconductor layer is subjected to a heat treatment in a range of 1050°
C. to 1200°
C. before said second group III nitride compound semiconductor layer is formed thereon.- View Dependent Claims (32, 33, 34)
-
-
22. A group III nitride compound semiconductor device, comprising:
-
a first layer comprising a group III nitride compound semiconductor having a thickness of from 50Å
to 3000Å and
formed on a substrate having a temperature not less than 400°
C.; and
a second layer comprising a group III nitride compound semiconductor formed on said first layer, and having a crystallinity characterized b an x-ray rocking curve having a full width at half maximum (FWHM) of less than about 25 seconds, wherein said first layer is subjected to a heat treatment in a range of 1050°
C. to 1200°
C. before said second layer is formed thereon.- View Dependent Claims (35, 36, 37)
-
Specification