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Lithographic projection apparatus, device manufacturing method and device manufactured thereby

  • US 6,714,279 B2
  • Filed: 08/31/2001
  • Issued: 03/30/2004
  • Est. Priority Date: 09/04/2000
  • Status: Expired due to Fees
First Claim
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1. A lithographic projection apparatus comprising:

  • a radiation system to supply a projection beam of radiation;

    a support structure to support patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern;

    a substrate table to hold a substrate; and

    a projection system disposed in an optical path between said patterning structure and said substrate table to project the patterned beam onto a target of the substrate, wherein a space containing at least part of said projection system is at a pressure of about 0.1 to 10 Pa and contains argon, nitrogen, helium or a mixture thereof.

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