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Chip scale packages performed by wafer level processing

  • US 6,717,245 B1
  • Filed: 06/02/2000
  • Issued: 04/06/2004
  • Est. Priority Date: 06/02/2000
  • Status: Expired due to Term
First Claim
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1. A semiconductor device comprising:

  • a semiconductor element having an active surface bounded by an inside perimeter of a plurality of channels;

    at least one bond pad over the active surface;

    an intermediate conductive element associated with the at least one bond pad and projecting from the active surface;

    an encapsulant layer over at least the active surface of the semiconductor element and the plurality of channels, the intermediate conductive element having a surface exposed through the encapsulant layer, the exposed surface substantially conforming to a surface of the encapsulant layer;

    depressions in the surface of the encapsulant layer over the channels; and

    an external conductive element disposed over the intermediate conductive element, the external conductive element contacting the intermediate conductive element at the exposed surface of the intermediate conductive element and projecting beyond the surface of the encapsulant layer.

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