Method and system of monitoring apparatuses of manufacturing IC

• US 6,718,220 B2
• Filed: 11/29/2001
• Issued: 04/06/2004
• Est. Priority Date: 11/29/2001
• Status: Expired due to Term

• Current Assignee: Winbond Electronics Corporation
• Original Assignee: Winbond Electronics Corporation
• Inventors: Chen, Chung-Hsin
• Primary Examiner(s): Picard, Leo
• Assistant Examiner(s): CABRERA, ZOILA E
• Application Number:
  US09/995,645
• Publication Number:
  US 20030100970A1
• Time in Patent Office: 859 Days
• Field of Search: 700/108, 700/109, 700/110, 700/111, 700/121, 700/117, 702/182-184
• US Class Current: 700/108
• CPC Class Codes: G05B 19/41885 characterised by modeling, simulation of the manufacturing system
• CPC Class Codes: G05B 2219/32351 Visual, graphical animation of process
• CPC Class Codes: G05B 2219/32356 For diagnostics
• CPC Class Codes: G05B 2219/32371 Predict failure time by analysing history fault logs of same machines in databases
• CPC Class Codes: G05B 2219/45031 Manufacturing semiconductor wafers
• CPC Class Codes: Y02P 90/02 Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Abstract

A method and system of monitoring apparatuses of manufacturing integrated circuit (IC) detects the problems during wafers processing by replaying the apparatus events. First, the method and system download the data of apparatus events, and then calculate the achievement indices. Then, the method and system establish the control chart to determined limitative rules, and execute the replaying system by establishing the computer interface system therewith to detect the abnormal point so as to proceed a rectification. The method and system of monitoring apparatuses of manufacturing IC review the past achievements by establishing a model for replaying apparatus history and achievements, and foresee the future problems by establishing control charts and a knowledge archive of rules.

Claims

1. A method of monitoring apparatuses of manufacturing integrated circuit (IC), while a plurality of lots of wafers are processed by a plurality of apparatuses, used for monitoring a plurality of apparatus events, the method of monitoring apparatuses of manufacturing IC comprising:

providing a database with a plurality of data of the apparatus events;

downloading the data of the apparatus events from the database;

calculating a plurality of achievement indices by using the data of the apparatus events;

establishing a control chart by using the achievement indices, wherein the achievement indices comprises a production output (move), a productive time (PT), a pieces of hour (POH), a time of waiting for material (loss time;

LT), a batch count (batch), a averaged waiting time of WIP (W), and a waiting length of WIP (L);

establishing a knowledge archive of rules by using the data of the apparatus events, the achievement indices, and the control chart, and determining a plurality of limitative rules to detect an abnormal point;

forming a calendar file by sorting the data of the apparatus events with time; and

executing a step of replaying the apparatus events so as to proceed a rectification.

2. The method of monitoring apparatuses of manufacturing IC of claim 1, wherein the data of the apparatus events comprises:

an apparatus status, a plurality of transferred out accounts, and a plurality of data of work in process (WIP).

3. The method of monitoring apparatuses of manufacturing IC of claim 1, wherein the control chart is established by gathering about 60 data in 2 months of the data of the apparatus events, and restricted by 3 standard deviations.

4. The method of monitoring apparatuses of manufacturing IC of claim 1, wherein the calendar file comprises a plurality of changes of the apparatus statuses, transferred out accounts, and WIP.

5. The method of monitoring apparatuses of manufacturing IC of claim 1, wherein the step of replaying apparatus events further comprises establishing a apparatus replaying system by establishing a plurality of graphic interfaces with the calendar file and the knowledge archive of rules.

6. The method of monitoring apparatuses of manufacturing IC of claim 5, wherein the apparatus replaying system is programmed by the language which is selected from a group consisting of visual basic and foxpro.

7. A method of monitoring apparatuses of manufacturing integrated circuit (IC), while a plurality of lots of wafers are processed by a plurality of apparatuses, used for monitoring a plurality of apparatus events, the method of monitoring apparatuses of manufacturing IC comprising:

providing a database with a plurality of data of the apparatus events;

downloading the data of the apparatus events from the database;

calculating a plurality of achievement indices by using the data of the apparatus events, wherein the achievement indices comprises a production output (move), a productive time (PT), a pieces of hour (POH), a time of waiting for material (loss time;

LT), a batch count (batch), an averaged waiting time of WIP (W), and a waiting length of WIP (L);

establishing a control chart by using the achievement indices;

establishing a knowledge archive of rules by using the data of the apparatus events, the achievement indices, and the control chart;

forming a calendar file by sorting the data of apparatus events with time; and

executing a step of replaying apparatus events by a apparatus replaying system so as to read the apparatus events.

8. The method of monitoring apparatuses of manufacturing IC of claim 7, wherein the data of the apparatus events comprises:

an apparatus state, a plurality of transferred out account, and a plurality of data of work in process.

9. The method of monitoring apparatuses of manufacturing IC of claim 7, wherein the control chart is established by gathering about 60 data in 2 months of the data of the apparatus events, and restricted by 3 standard deviations.

10. The method of monitoring apparatuses of manufacturing IC of claim 7, wherein the calendar files comprises a plurality changes of apparatus statuses, transferred out accounts, and WIP.

11. The method of monitoring apparatuses of manufacturing IC of claim 7, wherein the step of establishing the knowledge archive with rules further comprises determining a plurality of limitative rules to detect an abnormal point.

12. The method of monitoring apparatuses of manufacturing IC of claim 7, wherein the step of replaying apparatus events by an apparatus replaying system further comprises establishing a plurality of graphic interfaces with the calendar file and the knowledge archive of rules.

13. The method of monitoring apparatuses of manufacturing IC of claim 7, wherein the replaying system of apparatuses is programmed by the language which is selected from a group consisting of visual basic and foxpro.

14. A system of monitoring apparatuses of manufacturing IC, to monitor a plurality of the apparatus events, wherein a plurality of apparatuses process a plurality of lots of wafers with a plurality of steps, the system of monitoring apparatuses of manufacturing IC comprising:

a control mainframe for controlling the apparatuses;

a data mainframe with a plurality of operation parameters for recording a plurality of data of the apparatus events and a plurality of process data; and

a control mainframe for executing a process of monitoring the apparatuses by replaying the apparatus events processing the lots of wafers, the process of monitoring apparatuses comprising;

downloading the data of the apparatus events from the data mainframe;

calculating a plurality of achievement indices by using the data of the apparatus events, wherein the achievement indices comprises a production output (move), a productive time (PT), a pieces of hour (POH), a time of waiting for material (loss time;

LT), a batch count (batch), an averaged waiting time of WIP (W), and a waiting length of WIP (L);

establishing a control chart by using the achievement indices;

establishing a knowledge archive of rules by using the data of the apparatus events, the achievement indices, and the control chart, and determining a plurality of limitative rules to detect an abnormal point;

forming a calendar file by sorting the data of apparatus events with time; and

executing a step of replaying apparatus events so as to proceed a rectification.

15. The system of monitoring apparatuses of manufacturing IC of claim 14, wherein the control chart is established by gathering about 60 data in 2 months of the data of apparatus events, and restricted by 3 standard deviations.

16. The system of monitoring apparatuses of manufacturing IC of claim 14, wherein the calendar files comprises a plurality changes of apparatus statuses, transferred out accounts, and WIP.

17. The system of monitoring apparatuses of manufacturing IC of claim 14, wherein the step of replaying the apparatus events further comprises establishing a apparatus replaying system by establishing a plurality of graphic interfaces with the calendar file and the knowledge archive of rules.

18. The system of monitoring apparatuses of manufacturing IC of claim 17, wherein the apparatus replaying system is programmed by the language which is selected from a group consisting of visual basic and foxpro.