Apparatus and method for controlling sonic treatment

• US 6,719,449 B1
• Filed: 04/27/2001
• Issued: 04/13/2004
• Est. Priority Date: 10/28/1998
• Status: Expired due to Term

• Current Assignee: Covaris, Inc.
• Original Assignee: Covaris, Inc.
• Inventors: Garrison, Brevard S., Laugharn, James A. Jr.
• Primary Examiner(s): SOOHOO, TONY GLEN
• Application Number:
  US09/830,473
• Time in Patent Office: 1,082 Days
• Field of Search: 366/127, 366/108, 366/145, 433/128
• US Class Current: 366/127
• CPC Class Codes: B01F 2215/0427 Numerical distance values, e.g. separation, position
• CPC Class Codes: B01F 2215/0431 Numerical size values, e.g. diameter of a hole or conduit, area, volume, length, width, or ratios thereof
• CPC Class Codes: B01F 2215/045 Numerical flow-rate values
• CPC Class Codes: B01F 2215/0454 Numerical frequency values
• CPC Class Codes: B01F 2215/0468 Numerical pressure values
• CPC Class Codes: B01F 2215/0477 Numerical time values
• CPC Class Codes: B01F 31/80 Mixing by means of high-frequency vibrations above one kHz, e.g. ultrasonic vibrations
• CPC Class Codes: B01F 31/87 transmitting the vibratory energy by means of a fluid, e.g. by means of air shock waves
• CPC Class Codes: B01F 33/30 Micromixers
• CPC Class Codes: B01F 33/403 for mixing liquids B01F33/402, B01F33/405, B01F33/406 take precedence
• CPC Class Codes: B01F 33/408 Controlling
• CPC Class Codes: B01F 35/2115 Temperature
• CPC Class Codes: B01F 35/2202 Controlling the mixing process by feed-back, i.e. a measured parameter of the mixture is measured, compared with the set-value and the feed values are corrected
• CPC Class Codes: B01J 2219/00317 Microwell devices, i.e. having large numbers of wells
• CPC Class Codes: B01J 2219/00486 by sonication or ultrasonication
• CPC Class Codes: B01J 2219/00659 Two-dimensional arrays
• CPC Class Codes: C12M 35/04 Mechanical means, e.g. sonic waves, stretching forces, pressure or shear stimuli
• CPC Class Codes: C40B 60/14 for creating libraries
• CPC Class Codes: G01N 2035/00554 using ultrasound
• CPC Class Codes: G01N 2291/02836 Flow rate, liquid level
• CPC Class Codes: G01N 2291/02872 : Pressure
• CPC Class Codes: G01N 2291/02881 : Temperature

Abstract

Apparatus and methods are disclosed for treating a sample by selectively controlling sonic energy and/or selectively controlling the location of the sample relative to the sonic energy.

Claims

1. An apparatus for processing a sample using sonic energy, the apparatus comprising:

a sonic energy source for emitting sonic energy wherein the energy source generates a wavetrain substantially converging in a focal zone having a diameter less than about 2 cm;

a medium for coupling the wavetrain to the sample;

a reaction vessel for holding the sample and preventing the sample from contacting the medium, the reaction vessel disposed in a predetermined location relative to the sonic energy source;

a processor for controlling at least one of the sonic energy source and the location of the vessel relative to the focal zone according to a predetermined methodology, such that the sample is selectively exposed to sonic energy to produce a desired result.

2. The apparatus of claim 1 further comprising a feedback system connected to the processor for monitoring at least one condition to which the sample is subjected during processing, such that the processor controls at least one of the sonic energy source and the location of the sample in response to the at least one condition.

3. The apparatus of claim 2 wherein the feedback system comprises a sensor for monitoring the at least one condition.

4. The apparatus of claim 3 wherein the sensor monitors a mechanical occurrence.

5. The apparatus of claim 1 further comprising a temperature control unit for controlling temperature of the sample.

6. The apparatus of claim 5 wherein the processor controls the temperature control unit.

7. The apparatus of claim 1 further comprising a pressure control unit for controlling pressure to which the sample is exposed.

8. The apparatus of claim 7 wherein the processor controls the pressure control unit.

9. The apparatus of claim 1 wherein the sonic energy source generates sonic energy at least two different frequencies.

10. The apparatus of claim 1 wherein the wavetrain comprises a first wave and a different second wave.

11. The apparatus of claim 1 wherein the wavetrain comprises about 1000 cycles per burst at about a 10% duty cycle at about 15 MPa.

12. The apparatus of claim 1 wherein the processor comprises a device for moving the sample from a first location to a second location.

13. The apparatus of claim 12 wherein the device for moving the sample comprises a stepper motor.

14. The apparatus of claim 1 wherein the focal zone has an axial length of less than about 6 cm.

15. The apparatus of claim 1 wherein the wavetrain converges in a focal zone having a diameter of less than about 1 cm.

16. The apparatus of claim 15 wherein the focal zone has a diameter of about 3 mm and an axial length of about 15 mm.

17. The apparatus of claim 15 wherein the focal zone has a diameter of about 2 mm and an axial length of about 6 mm.

18. The apparatus of claim 15 wherein the wavetrain converges in a focal zone having a diameter of less than about 1 mm.

19. A method for processing a sample using sonic energy, the method comprising the steps of:

generating a sonic energy wavetrain substantially converging in a focal zone having a diameter of less than about 2 cm;

exposing the sample to the sonic energy wavetrain through a medium while preventing the sample from contacting the medium; and

controlling at least one of the sonic energy and a location of the sample relative to the focal zone according to a predetermined methodology, such that the sample is selectively exposed to sonic energy to produce a desired result.

20. The method of claim 19 comprising the steps of sensing at least one condition to which the sample is subjected during processing and altering at least one of the sonic energy and the location of the sample in response to the at least one condition.

21. The method of claim 20 wherein during the sensing step, the at least one condition is a mechanical occurrence.

22. The method of claim 20 wherein during the altering step, the intensity of the sonic energy is altered.

24. The method of claim 19 comprising the step of controlling pressure to which the sample is exposed.

25. The method of claim 19 wherein the sonic energy is focused on the sample.

26. The method of claim 19 wherein during the controlling step, the intensity of the sonic energy is controlled.

27. The method of claim 19 wherein the sonic energy comprises at least two different frequencies.

28. The method of claim 19 wherein the wavetrain comprises a first wave and a different second wave.

29. The method of claim 19 wherein the wavetrain comprises about 1000 cycles per burst at about a 10% duty cycle at about 15 MPa.

30. The method of claim 19 wherein the focal zone has an axial length of less than about 6 cm.

31. The method of claim 19 wherein the wavetrain converges in a focal zone having a diameter of less than about 1 cm.

32. The method of claim 31 wherein the focal zone has a diameter of about 3 mm and an axial length of about 15 mm.

33. The method of claim 31 wherein the focal zone has a diameter of about 2 mm and an axial length of about 6 mm.

34. The method of claim 31 wherein the wavetrain converges in a focal zone having a diameter of less than about 1 mm.

23. The method of clam 19 comprising the step of controlling temperature of the sample.