Method of preventing leakage current of a metal-oxide semiconductor transistor

• US 6,723,609 B2
• Filed: 11/13/2002
• Issued: 04/20/2004
• Est. Priority Date: 02/04/2002
• Status: Active Grant

• Current Assignee: United Microelectronics Corporation
• Original Assignee: United Microelectronics Corporation
• Inventors: Yang, Ming-Sheng, Kao, Chia-Hung, Chien, Chin-Cheng
• Primary Examiner(s): Niebling, John F.
• Assistant Examiner(s): POMPEY, RON EVERETT
• Application Number:
  US10/065,717
• Publication Number:
  US 20030148585A1
• Time in Patent Office: 524 Days
• Field of Search: 438/303, 438/299, 438/301, 438/304, 438/305, 438/592, 438/595, 438/596, 438/655, 438/683, 438/230, 438/514
• US Class Current: 438/303
• CPC Class Codes: H01L 21/28518 the conductive layers comprising silicides H01L21/28537 takes precedence
• CPC Class Codes: H01L 29/665 using self aligned silicidation, i.e. salicide formation of conductive layers comprising silicides H01L21/28518
• CPC Class Codes: H01L 29/6656 using multiple spacer layers, e.g. multiple sidewall spacers
• CPC Class Codes: H01L 29/6659 with both lightly doped source and drain extensions and source and drain self-aligned to the sides of the gate, e.g. lightly doped drain [LDD] MOSFET, double diffused drain [DDD] MOSFET
• CPC Class Codes: H01L 29/66598 forming drain [D] and lightly doped drain [LDD] simultaneously, e.g. using implantation through the wings a T-shaped layer, or through a specially shaped layer
• CPC Class Codes: H01L 29/7833 with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's for thin film transistors H01L29/78618

Abstract

A gate oxide layer and a gate are sequentially formed on a substrate, and a source/drain extension is formed in the substrate thereafter. A liner layer is then formed to cover the substrate, and a first dielectric layer and a second dielectric layer are sequentially formed on the liner layer. By performing an etching process, a L-shaped spacer is formed on either side of the gate. Portions of the liner layer uncovered by the L-shaped spacer are then removed, and a step source/drain extension and a source/drain are simultaneously formed in the substrate thereafter. Finally, a salicide process is performed to form a silicide layer on the gate and on portions of the silicon substrate surface above the source/drain.

Claims

1. A method of fabricating a metal-oxide semiconductor transistor (MOS transistor) on a substrate comprising:

sequentially forming a gate oxide layer and a gate on the substrate;

performing a first ion implantation process to form a first doped region in the substrate;

sequentially forming a liner layer, a dielectric layer and a sacrificial layer on the substrate;

performing a first etching process to simultaneously form an arc-shaped spacer on either side of the gate and remove portions of the dielectric layer and the sacrificial layer atop the gate by utilizing the liner layer as a first stop layer;

performing a second etching process to remove portions of the sacrificial layer within the arc-shaped spacer by utilizes the dielectric layer as a second stop layer, and constructing a L-shaped spacer on either side of the gate;

performing a third etching process to remove portions of the liner layer not covered by the L-shaped spacer;

performing a second ion implantation process to form a second doped region with a gradient profile in portions of the substrate adjacent to either side of the L-shaped spacer; and

performing a self-aligned silicide (salicide) process to form a silicide layer on the gate and on exposed portions of the substrate surface above the second doped region.

2. The method of claim 1 wherein the substrate is a silicon substrate.

3. The method of claim 1 wherein the gate comprises an offset spacer on either side of the gate.

4. The method of claim 1 wherein the liner layer, the dielectric layer and the sacrificial layer respectively comprise silicon oxide, nitride and polysilicon.

5. The method of claim 1 wherein the first and second doped regions are in a gradient profile, the first doped region is employed as a source/drain extension, and the second doped region comprises a step source/drain extension and a source/drain of the MOS transistor employed to prevent leakage current of the silicide layer.

6. The method of claim 5 wherein the depth and the width of the step source/drain extension are respectively determined by the thickness of the dielectric layer and the width of the L-shaped spacer.

7. The method of claim 5 wherein th silicide layer is formed by the steps of:

forming a metal layer on the gate and on portions of the substrate surface above the source/drain;

performing a first rapid thermal process (RTP);

performing a wet etching process to remove unreacted portions of th metal layer on th surface of the substrate; and

performing a second RTP.

8. The method of claim 7 wherein the metal layer comprises cobalt (Co).

9. The method of claim 1 wherein the first and second doped regions are doped with either arsenic (As) atoms or phosphorus (P) atoms.

10. The method of claim 1 wherein the first and second doped region are doped with either one of boron difluoride (BF₂⁺) ions, boron (B) atoms or indium (In) atoms.

11. A method of fabricating a MOS transistor on a substrate comprising:

sequentially forming a gate oxide layer and a gat on the substrate;

performing a first ion implantation process to form a first doped region in the substrate;

forming a liner layer to cover the substrate;

sequentially forming a dielectric layer and a sacrificial layer on the lin r layer;

performing a first etching process to simultaneously form an arc-shaped spacer on either side of the gate and remove portions of the dielectric layer and the sacrificial layer atop the gate by utilizing the liner layer as a first stop layer;

performing a second etching process to remove portions of the sacrificial layer within the arc-shaped spacer by utilizes the dielectric layer as a second stop layer, and constructing a L-shaped spacer on either side of the gate;

performing a third etching process to remov portions of the liner layer not covered by the L-shaped spacer;

performing a second ion implantation process to simultaneously form a second doped region and a third doped region in the substrate; and

performing a salicide process to form a silicide layer on the gate and on portions of the substrat surface above the third doped region.

12. The method of claim 11 wherein the substrate is a silicon substrate.

13. The method of claim 11 wherein the first, second and third doped regions are in a gradient profile and are respectively employed as a source/drain extension, a step source/drain extension and a source/drain of the MOS transistor, and th second doped region is employed to prevent leakag current of the silicide layer.

14. The method of claim 11 wherein the liner layer, the dielectric layer and the sacrificial layer respectively comprise silicon oxide, nitride and polysilicon.

15. The method of claim 11 wherein the first, second and third doped regions are doped with either arsenic atoms or phosphorus atoms.

16. The method of claim 11 wherein the first, second and third doped regions are doped with either one of boron difluoride ions, boron atoms or indium atoms.

17. The method of claim 11 wherein the depth and the width of the second doped region are respectively determined by the thickness of the dielectric layer and the width of the L-shaped spacer.

18. The method of claim 11 wherein the silicide layer is formed by the steps of:

forming a metal layer on the gate and on portions of the substrate surface above the third doped region;

performing a first RTP;

performing a wet etching process to remove unreacted portions of the metal layer on the surface of the substrate; and

performing a second RTP.

19. The method of claim 18 wherein the metal layer comprises cobalt.