Lithographic apparatus, device manufacturing method, and device manufactured thereby

• US 6,727,977 B2
• Filed: 06/06/2002
• Issued: 04/27/2004
• Est. Priority Date: 06/06/2001
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Butler, Hans
• Primary Examiner(s): MATHEWS, ALAN A
• Application Number:
  US10/163,161
• Publication Number:
  US 20030043354A1
• Time in Patent Office: 691 Days
• Field of Search: 355/53, 356/399, 356/400, 356/401, 702/150
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70725 control

Abstract

A control system for the mask table and substrate table predicts the momentary substrate table position error and feeds it into the mask table control loop, adding it to the mask table set point and as a force to the mask table.

Claims

1. A lithographic projection apparatus, comprising:

a radiation system constructed and arranged to provide a projection beam of radiation;

a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;

a substrate table to hold a substrate;

a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate,

a first driving device constructed and arranged to move the support structure in a given reference direction substantially parallel to the plane of the patterning device;

a second driving device constructed and arranged to move the substrate table parallel to the reference direction so as to be synchronous with the motion of the support structure;

a first position measuring device constructed and arranged to determine the momentary position of the patterning device with respect to a fixed reference point;

a second position measuring device constructed and arranged to determine the momentary position of the substrate table with respect to a fixed reference point;

a position comparator constructed and arranged to compare the measured momentary position of the substrate table with a desired momentary position of the substrate table to generate a position error signal in accordance with a difference between the two positions; and

a position error predictor that generates a future position error signal based on one or more previous position error signals; and

a position correction device that adjusts the momentary position of the patterning device based upon the future position error signal.

2. An apparatus according to claim 1, wherein the position error predictor is adapted to predict a first or higher derivative of the position error signal.

3. An apparatus according to claim 1, wherein the position error predictor comprises a sine-based predictor operating on n previous samples of the position error signal.

4. An apparatus according to claim 1, wherein the position error predictor is adapted to effect a polynomial prediction based on n previous samples of the position error signal.

5. An apparatus according to claim 3, wherein the position error predictor comprises a finite impulse response filter.

6. An apparatus according to claim 3, wherein n is the minimal value required to obtain a full and sufficient set of equation.

7. An apparatus according to claim 1, wherein the support structure comprises a mask table to hold a mask.

8. An apparatus according to claim 1, wherein the radiation system comprises a radiation source.

12. An apparatus according to claim 4, wherein the position error predictor comprises a finite impulse response filter.

9. A lithographic projection apparatus, comprising:

a radiation system constructed and arranged to provide a projection beam of radiation;

a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;

a substrate table to hold a substrate;

a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;

a first driving device constructed and arranged to move the support structure in a given reference direction substantially parallel to the plane of the patterning device;

a second driving device constructed and arranged to move the substrate table parallel to the reference direction so as to be synchronous with the motion of the support structure;

a first position measuring device constructed and arranged to determining the momentary position of the patterning device with respect to a fixed reference point;

a second position measuring device constructed and arranged to determine the momentary position of the substrate table with respect to a fixed reference point;

a position comparator constructed and arranged to compare the measured momentary position of the patterning device with a desired momentary position of the patterning device to generate a position error signal in accordance with a difference between the two positions; and

a position error predictor that generates a future position error signal based on one or more previous position error signals; and

a position correction device that adjusts the momentary position of the substrate table based upon the future position error signal.

10. A device manufacturing method, comprising:

providing a substrate that is at least partially covered by a layer of radiation-sensitive material;

providing a projection beam of radiation using a radiation system;

using a patterning device to endow the projection beam with a pattern in its cross-section;

projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, wherein the projecting comprises moving a support structure supporting the patterning device in a given reference direction substantially parallel to the plane of the patterning device;

moving the substrate table parallel to the reference direction so as be synchronized with the motion of the support structure;

determining the momentary position of the mask table with respect to a fixed reference point;

determining the momentary position of the substrate table with respect to a fixed reference point;

comparing the measured momentary position of the substrate table with a desired momentary position of the substrate table to generate a position error signal in accordance with a difference between the two positions; and

predicting a future position error based on one or more previous position error signals and adjusting the momentary position of the mask table so as to compensate for such difference.

11. A device manufactured according to the method of claim 10.