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Single wafer megasonic cleaner method, system, and apparatus

  • US 6,730,176 B2
  • Filed: 02/20/2002
  • Issued: 05/04/2004
  • Est. Priority Date: 07/09/2001
  • Status: Active Grant
First Claim
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1. A method for removing contaminants from the surface of a workpiece comprising the steps of:

  • rotating the workpiece about an axis, at a low angular velocity;

    directing a stream of cleaning fluid, having megasonic energy, at a surface of the workpiece, such that said stream of cleaning fluid delivers substantially uniform megasonic energy to all points on the surface of the workpiece, and then rotating the workpiece at a high angular velocity until the surface of the workpiece is dry of cleaning fluids.

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