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Alignment mark system for mass transport processes

  • US 6,731,438 B2
  • Filed: 11/29/2000
  • Issued: 05/04/2004
  • Est. Priority Date: 11/29/2000
  • Status: Expired due to Fees
First Claim
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1. A mass transported alignment mark system, comprising:

  • a substrate that has been subjected to a mass transport process; and

    a lens alignment structure formed on the substrate that yields a light pattern when the substrate or a plane near the substrate is imaged;

    a metal layer that is aligned to the light pattern from the lens structure.

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