Multilayer article and method of making by arc plasma deposition
First Claim
1. A method of depositing a plurality of layers on a substrate, the method comprising steps of:
- flowing a plasma gas in a plasma generation chamber in communication with a deposition chamber, the deposition chamber having a lower pressure than the plasma generation chamber, the article being disposed in the deposition chamber;
generating an arc in the plasma generation chamber to create a plasma, which flows into the deposition chamber;
injecting a first material comprising and a first oxidant at least one of a polymerizable hydrocarbon and an organosilicon material into the plasma and reacting the first material to form an interlayer on the substrate, the interlayer comprising a polymerized organosilicon material; and
injecting a second material comprising and a second oxidant at least one of an elemental metal and an organometallic compound into the plasma and reacting the second material to form a second layer comprising an inorganic ultraviolet absorbing material on the interlayer, the second material comprising a gaseous reagent, wherein the interlayer has a coefficient of thermal expansion that is between that of the substrate and the second layer.
3 Assignments
0 Petitions
Accused Products
Abstract
According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material. The interlayer may comprise a polymerized organosilicon material or a polymerized hydrocarbon material, for example. The second layer may comprise a metal oxide or zinc sulfide, for example. The third layer may comprise an oxidized organosilicon material, for example.
-
Citations
16 Claims
-
1. A method of depositing a plurality of layers on a substrate, the method comprising steps of:
-
flowing a plasma gas in a plasma generation chamber in communication with a deposition chamber, the deposition chamber having a lower pressure than the plasma generation chamber, the article being disposed in the deposition chamber;
generating an arc in the plasma generation chamber to create a plasma, which flows into the deposition chamber;
injecting a first material comprising and a first oxidant at least one of a polymerizable hydrocarbon and an organosilicon material into the plasma and reacting the first material to form an interlayer on the substrate, the interlayer comprising a polymerized organosilicon material; and
injecting a second material comprising and a second oxidant at least one of an elemental metal and an organometallic compound into the plasma and reacting the second material to form a second layer comprising an inorganic ultraviolet absorbing material on the interlayer, the second material comprising a gaseous reagent, wherein the interlayer has a coefficient of thermal expansion that is between that of the substrate and the second layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
-
Specification